Lithographic apparatus and device manufacturing method utilizing a microlens array at an image plane

• US 7,180,577 B2
• Filed: 12/17/2004
• Issued: 02/20/2007
• Est. Priority Date: 12/17/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Baselmans, Johannes Jacobus Matheus, Visser, Huibert
• Primary Examiner(s): Rutledge; D.
• Application Number:
  US11/013,938
• Publication Number:
  US 20060132751A1
• Time in Patent Office: 795 Days
• Field of Search: None
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A lithographic apparatus includes a radiation system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the radiation system. The projection system projects the patterned beam onto a target portion of a substrate. The projection system comprising a pupil positioned at a pupil plane of the projection system and an array of lenses positioned at an image plane of the projection system. The patterning device is conjugate to the array of lenses and the pupil is conjugate to the substrate.

Claims

1. A lithographic apparatus, comprising:

a radiation system that provides a beam of radiation;

a patterning device that patterns the beam; and

a projection system that projects the patterned beam onto a target portion of a substrate, the projection system comprising,

a pupil stop positioned at a pupil plane of the projection system, and

an array of lenses positioned at an image plane of the projection system,

wherein the patterning device is conjugate to the array of lenses, and

wherein the pupil stop is conjugate to the substrate, the substrate being spaced from the image plane.

2. The lithographic apparatus of claim 1, wherein:

each lens in the array of lenses receives a segment of an image of the patterning device; and

a Fourier transform of each of the segments of the image of the patterning device is formed on the substrate.

3. The lithographic apparatus of claim 2, further comprising:

an actuator that moves the substrate while the projection system projects the patterned beam onto the target portion of the substrate.

4. The lithographic apparatus of claim 1, wherein:

the patterning device comprises an array of individually controllable elements.

5. The lithographic apparatus of claim 4, further comprising:

a refraction grating that divides the beam of radiation into a plurality of sub-beams, wherein each sub-beam is directed onto one or more elements in the array of individually controllable elements.

6. The lithographic apparatus of claim 1, wherein the substrate is a semiconductor wafer.

7. The lithographic apparatus of claim 1, wherein the substrate is a flat panel display glass substrate.

8. The lithographic apparatus of claim 1, further comprising:

a spot generator that divides the beam of radiation into a plurality of sub-beams that are directed onto the patterning device.

9. The lithographic apparatus of claim 8, further comprising:

a first stop positioned within the radiation system;

a second stop positioned adjacent the spot generator and positioned conjugate to the first stop; and

a third stop positioned adjacent the pupil and positioned conjugate to the second stop.

10. The lithographic apparatus of claim 9, further comprising:

a filter positioned within the pupil plane.

11. A flat panel display formed using the lithographic apparatus of claim 1.

12. A device manufacturing method, comprising:

patterning a beam of radiation using a patterning device;

directing the patterned beam onto a microlens array in a projection system, the microlens array being positioned conjugate to the patterning device;

forming a plurality of segments of the pattern beam, each segment being formed using a respective lens in the microlens array; and

projecting a Fourier transform of each of the segments of the patterned beam onto a target portion of a substrate.

13. A flat panel display formed using the method of claim 12.

14. A method, comprising:

positioning a patterning device at an object plane of a projection system;

positioning a microlens array at an image plane of the projection system, which is conjugate to the patterning device at the object plane; and

positioning a workpiece conjugate to a pupil plane of the projection system,

wherein a beam of radiation is patterned using the patterning device, and

wherein the patterned beam is projected onto a target portion of the workpiece using the projection system.

15. The method of claim 14, further comprising:

positioning a spot generator before the patterning device that generates a plurality of spots which impinge on the patterning device.

16. The method of claim 15, further comprising:

positioning a first stop within a radiation source that generates the beam of radiation;

positioning a second stop adjacent the spot generator and conjugate to the first stop;

positioning a third stop at the pupil plane and conjugate to the second stop; and

positioning a fourth stop adjacent the substrate and conjugate to the third stop.

17. The method of claim 16, further comprising:

positioning a filter within the pupil plane.

18. A flat panel display formed using the method of claim 14.