Structure and manufacturing process of a nano device transistor for a biosensor
First Claim
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1. A structure of a nano device transistor for a biosensor, comprising:
- a silicon substrate having SiO2 deposited thereon;
a bottom gate positioned on the silicon substrate having SiO2 deposited thereon;
a gate dielectric layer positioned on the bottom gate being an interface layer for insulating the bottom gate;
a nano channel layer positioned on the gate dielectric layer;
a drain positioned extending over a first portion of a top surface of the nano channel layer and a first portion of a top surface of the gate dielectric layer;
a source positioned extending over a second portion of the top surface of the nano channel layer and a second portion of the top surface of the gate dielectric layer;
a ceiling gate dielectric layer comprising a first ceiling gate dielectric layer portion and a second ceiling gate dielectric layer portion positioned on the drain and the source, respectively;
a ceiling gate positioned on the ceiling gate dielectric layer;
a first protection layer positioned on the first ceiling gate dielectric layer portion; and
a second protection layer positioned on the second ceiling gate dielectric layer portion.
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Abstract
The present invention relates to a structure and manufacturing process of a nano device transistor for a biosensor. The structure, the manufacturing process and the related circuit for a carbon nano tube or nano wire transistor biosensor device are provided. The refurbished nano device is used for absorbing various anti-bodies so as to detect the specific antigens or absorbing various biotins. Therefore, the object of the present invention to detect the specific species for bio measurement can be achieved.
38 Citations
12 Claims
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1. A structure of a nano device transistor for a biosensor, comprising:
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a silicon substrate having SiO2 deposited thereon; a bottom gate positioned on the silicon substrate having SiO2 deposited thereon; a gate dielectric layer positioned on the bottom gate being an interface layer for insulating the bottom gate; a nano channel layer positioned on the gate dielectric layer; a drain positioned extending over a first portion of a top surface of the nano channel layer and a first portion of a top surface of the gate dielectric layer; a source positioned extending over a second portion of the top surface of the nano channel layer and a second portion of the top surface of the gate dielectric layer; a ceiling gate dielectric layer comprising a first ceiling gate dielectric layer portion and a second ceiling gate dielectric layer portion positioned on the drain and the source, respectively; a ceiling gate positioned on the ceiling gate dielectric layer; a first protection layer positioned on the first ceiling gate dielectric layer portion; and a second protection layer positioned on the second ceiling gate dielectric layer portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification