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Method to pattern a substrate

  • US 7,186,486 B2
  • Filed: 08/04/2003
  • Issued: 03/06/2007
  • Est. Priority Date: 08/04/2003
  • Status: Active Grant
First Claim
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1. A method of lithography for enhancing uniformity of critical dimensions of features patterned onto a workpiece using a multipass writing strategy, the method comprising the actions of:

  • coating said workpiece with a coating sensitive to an energy beam,providing an energy beam source,determining an individual dose for each pass so that each pass will affect said coating essentially equal, thereby enhancing said uniformity of critical dimension,exposing said coating in said multipass writing strategy by using said individual dose for each pass,developing said coating.

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