Method to pattern a substrate
First Claim
1. A method of lithography for enhancing uniformity of critical dimensions of features patterned onto a workpiece using a multipass writing strategy, the method comprising the actions of:
- coating said workpiece with a coating sensitive to an energy beam,providing an energy beam source,determining an individual dose for each pass so that each pass will affect said coating essentially equal, thereby enhancing said uniformity of critical dimension,exposing said coating in said multipass writing strategy by using said individual dose for each pass,developing said coating.
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Abstract
An aspect of the present invention includes a method of lithography to enhance uniformity of critical dimensions of features patterned onto a workpiece. Said workpiece is coated with a coating sensitive to electromagnetic radiation. An electromagnetic radiation source having an illumination intensity is provided. At least one object pixel of electromagnetic radiation is created. A predetermined pattern is exposed, by using said at least one object pixel, on at least a portion of said workpiece in a first exposure pass with a first dose to provide less than full exposure of said coating sensitive to electromagnetic radiation. Said exposing action is repeated at least until said portion of said coating sensitive to electromagnetic radiation is fully exposed, wherein said dose is increased for every following pass. Said fully exposed coating sensitive to electromagnetic radiation is developed.
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Citations
17 Claims
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1. A method of lithography for enhancing uniformity of critical dimensions of features patterned onto a workpiece using a multipass writing strategy, the method comprising the actions of:
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coating said workpiece with a coating sensitive to an energy beam, providing an energy beam source, determining an individual dose for each pass so that each pass will affect said coating essentially equal, thereby enhancing said uniformity of critical dimension, exposing said coating in said multipass writing strategy by using said individual dose for each pass, developing said coating. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification