Chuck with integrated wafer support
First Claim
Patent Images
1. A probe station comprising:
- (a) a chamber that at least partially encloses a chuck assembly therein;
(b) said chuck assembly having an upper surface thereon suitable to support a wafer thereon;
(c) a plurality of members located within a periphery of said chuck assembly suitable to support said wafer on said plurality of members while said wafer is not simultaneously supported by said upper surface;
(d) said members and said upper surface capable of relative vertical movement with respect to one another such that said wafer may be moved between a position where said wafer is supported by said plurality of members while not simultaneously supported by said upper surface, and a position where said wafer is supported by said upper surface;
(e) said chuck assembly movable from a location completely within said chamber to a location at least partially outside said chamber.
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Accused Products
Abstract
An improved chuck with lift pins within a probe station.
604 Citations
19 Claims
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1. A probe station comprising:
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(a) a chamber that at least partially encloses a chuck assembly therein; (b) said chuck assembly having an upper surface thereon suitable to support a wafer thereon; (c) a plurality of members located within a periphery of said chuck assembly suitable to support said wafer on said plurality of members while said wafer is not simultaneously supported by said upper surface; (d) said members and said upper surface capable of relative vertical movement with respect to one another such that said wafer may be moved between a position where said wafer is supported by said plurality of members while not simultaneously supported by said upper surface, and a position where said wafer is supported by said upper surface; (e) said chuck assembly movable from a location completely within said chamber to a location at least partially outside said chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A chuck assembly comprising:
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(a) said chuck assembly having an upper surface thereon suitable to support a wafer thereon; (b) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer on said plurality of members while said wafer is not simultaneously supported by said upper surface; (c) said members and said upper surface capable of relative vertical movement with respect to one another such that said wafer may be moved between a position where said wafer is supported by said plurality of members while not simultaneously supported by said upper surface, and a position where said wafer is supported by said upper surface; (d) said chuck assembly inhibited from lateral movement when said plurality of members are fully extended. - View Dependent Claims (11, 12, 13, 14)
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15. A chuck assembly comprising:
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(a) said chuck assembly having an upper surface thereon suitable to support a wafer thereon; (b) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer on said plurality of members while said wafer is not simultaneously supported by said upper surface; (c) said members and said upper surface capable of relative vertical movement with respect to one another such that said wafer may be moved between a position where said wafer is supported by said plurality of members while not simultaneously supported by said upper surface, and a position where said wafer is supported by said upper surface; (d) increasing a vacuum provided to said upper surface as a result of decreasing the extension of said plurality of members, where said plurality of members are not substantially even with said upper surface. - View Dependent Claims (16, 17)
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18. A chuck assembly comprising:
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(a) said chuck assembly having an upper surface thereon suitable to support a wafer thereon; (b) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer on said plurality of members while said wafer is not simultaneously supported by said upper surface; (c) said members and said upper surface capable of relative vertical movement with respect to one another such that said wafer may be moved between a position where said wafer is supported by said plurality of members while not simultaneously supported by said upper surface, and a position where said wafer is supported by said upper surface; (d) said chuck assembly inhibited from lateral movement when said plurality of members are at a first height above said upper surface and free from being inhibited when said plurality of members are at a second height above said upper surface, wherein said first height is greater than said second height.
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19. A chuck assembly comprising:
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(a) said chuck assembly having an upper surface thereon suitable to support a wafer thereon; (b) a plurality of members located within the periphery of said chuck assembly suitable to support said wafer on said plurality of members while said wafer is not simultaneously supported by said upper surface; (c) said members and said upper surface capable of relative vertical movement with respect to one another such that said wafer may be moved between a position where said wafer is supported by said plurality of members while not simultaneously supported by said upper surface, and a position where said wafer is supported by said upper surface; (d) said chuck assembly inhibited from relative movement of said members to a position above said upper surface when said shuck assembly is in a position suitable for probing said wafer.
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Specification