Methods for forming an array of MEMS optical elements
First Claim
1. A method for forming an array of MEMS optical elements, the method comprising:
- providing a single crystal silicon on insulator (SOI) wafer having a layered structure comprising a silicon wafer layer having an internal oxide layer formed thereon and having a device silicon layer formed on the internal oxide layer, wherein a top surface of the device silicon layer has formed thereon a top oxide layer, and wherein the bottom surface of the silicon wafer layer has formed thereon a bottom oxide layer;
forming a bottom photoresist layer on the bottom oxide film layer having openings defining a bottom pocket;
forming a top photoresist layer on the top oxide film layer having openings defining a hinge region and open regions;
removing the top oxide layer in the hinge and open regions defined by the openings in the top photoresist layer to expose the hinge region of the device silicon layer;
forming a second photoresist layer on a top surface of the SOI wafer, the second photoresist layer patterning the hinge region of the device silicon layer so that a hinge can be formed;
etching the patterned hinge region to remove portions of the device silicon layer forming recessed portions defining the hinge;
removing the second photoresist layer, thereby exposing the underlying top oxide layer as a hard mask layer having openings in the hinge and open regions;
etching the device silicon layer through the openings in the hard mask wherein the recessed portions are etched until the internal oxide layer is reached, and wherein the unetched surfaces are partially etched leaving a portion of the unetched surfaces in place to define a thickness of the hinge;
etching the bottom surface of the SOI wafer through openings in the bottom oxide layer to remove material from the silicon wafer layer to form a pocket region defining a movable optical element supported by the hinge; and
etching the SOI wafer to remove the internal oxide layer in the pocket region.
12 Assignments
0 Petitions
Accused Products
Abstract
An embodiment of the invention comprises an optical element capable of motion in at least one degree of freedom wherein the motion in at least one degree of freedom is enabled by serpentine hinges configured to enable the optical element to move in at least one degree of freedom. The embodiment further includes driving elements configured to deflect the optical element in said at least one degree of freedom to controllably induce deflection in the optical element and a damping element to reduce magnitude of resonances. Another embodiment includes a MEMS optical apparatus comprising an optical element capable of motion in two degrees of freedom. The two degrees of freedom are enabled by two pairs of serpentine hinges. A first pair of serpentine hinges is configured to enable the optical element to move in one degree of freedom and a second pair of serpentine hinges is configured to enable the optical element to move in a second degree of freedom. The apparatus further includes driving elements configured to deflect the optical element in said two degrees of freedom and a damping element to reduce magnitude of resonances. The invention includes method embodiments for forming arrays of MEMS optical elements including reflector arrays.
96 Citations
13 Claims
-
1. A method for forming an array of MEMS optical elements, the method comprising:
-
providing a single crystal silicon on insulator (SOI) wafer having a layered structure comprising a silicon wafer layer having an internal oxide layer formed thereon and having a device silicon layer formed on the internal oxide layer, wherein a top surface of the device silicon layer has formed thereon a top oxide layer, and wherein the bottom surface of the silicon wafer layer has formed thereon a bottom oxide layer; forming a bottom photoresist layer on the bottom oxide film layer having openings defining a bottom pocket; forming a top photoresist layer on the top oxide film layer having openings defining a hinge region and open regions; removing the top oxide layer in the hinge and open regions defined by the openings in the top photoresist layer to expose the hinge region of the device silicon layer; forming a second photoresist layer on a top surface of the SOI wafer, the second photoresist layer patterning the hinge region of the device silicon layer so that a hinge can be formed; etching the patterned hinge region to remove portions of the device silicon layer forming recessed portions defining the hinge; removing the second photoresist layer, thereby exposing the underlying top oxide layer as a hard mask layer having openings in the hinge and open regions; etching the device silicon layer through the openings in the hard mask wherein the recessed portions are etched until the internal oxide layer is reached, and wherein the unetched surfaces are partially etched leaving a portion of the unetched surfaces in place to define a thickness of the hinge; etching the bottom surface of the SOI wafer through openings in the bottom oxide layer to remove material from the silicon wafer layer to form a pocket region defining a movable optical element supported by the hinge; and etching the SOI wafer to remove the internal oxide layer in the pocket region. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
-
8. A method for forming an array of MEMS optical elements, the method comprising:
-
providing a wafer having top surface and a bottom surface, the top surface having formed thereon a top insulating layer and the bottom surface having formed thereon a bottom insulating layer; forming a bottom mask layer on the bottom oxide film layer having openings defining a bottom pocket; forming a top mask layer on the top insulating layer having openings defining hinge regions and open structures; first etching to remove the top insulating layer in hinge and open regions defined by the openings in the top mask layer exposing a hinge region; forming a second mask layer on the top surface, the second mask layer patterning the hinge region so that a hinge can be formed; second etching the patterned hinge region and open region to form a hinge in the wafer; removing the second mask layer, thereby exposing the underlying top insulating layer as a hard mask layer having openings in the hinge and open regions; third etching the wafer through the openings in the hard mask wherein the recessed portions are etched in a timed etch leaving a portion of the unetched surfaces in place as hinges, thereby defining hinge thickness; fourth etching the bottom surface of the wafer through openings in the bottom oxide layer to remove material from the silicon wafer to form a pocket region defining a movable optical element supported by hinges; and forming a reflective layer on at least one surface of the movable optical element. - View Dependent Claims (9, 10, 11, 12, 13)
-
Specification