Thin-film battery having ultra-thin electrolyte and associated method
First Claim
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1. A method of fabricating a thin-film battery, comprising:
- providing a substrate;
forming an electrode first film on the substrate;
forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes;
depositing electrolyte material using a deposition source; and
supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and
forming an electrode third film on the second film,wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than 1000 Angstroms.
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Abstract
A method and system for fabricating solid-state energy-storage devices including fabrication films for devices without an anneal step. A film of an energy-storage device is fabricated by depositing a first material layer to a location on a substrate. Energy is supplied directly to the material forming the film. The energy can be in the form of energized ions of a second material. Supplying energy directly to the material and/or the film being deposited assists in controlling the growth and stoichiometry of the film. The method allows for the fabrication of ultrathin films such as electrolyte films and dielectric films.
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Citations
103 Claims
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1. A method of fabricating a thin-film battery, comprising:
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providing a substrate; forming an electrode first film on the substrate; forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes; depositing electrolyte material using a deposition source; and supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and forming an electrode third film on the second film, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than 1000 Angstroms. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51)
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52. An apparatus comprising:
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means for providing a substrate; means for forming an electrode first film on the substrate; means for forming an electrolyte second film on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein the means for forming the electrolyte second film includes; means for depositing electrolyte material using a deposition source; and means for supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and means for forming an electrode third film on the second film, wherein the electrolyte second film is deposited to a thickness of less than about 1000 Angstroms. - View Dependent Claims (53, 54, 55, 56, 93)
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57. A method of fabricating a thin-film battery, comprising:
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providing a substrate; forming an electrode first film on the substrate; forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes; depositing electrolyte material using a deposition source; and supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and forming an electrode third film on the second film, wherein the supplying energized particles includes supplying ions having an energy in the range of about 5 eV to about 50 eV, and wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than 1000 Angstroms. - View Dependent Claims (58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73)
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74. A method of fabricating a thin-film battery, comprising:
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providing a substrate; forming an electrode first film on the substrate; forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes; depositing electrolyte material using a deposition source; and supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and forming an electrode third film on the second film, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 200 Angstroms. - View Dependent Claims (75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 94)
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95. A method of fabricating a thin-film battery, comprising:
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providing a substrate; forming an electrode first film on the substrate; forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes; depositing electrolyte material using a deposition source; and supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and forming an electrode third film on the second film, wherein the forming of the first film includes depositing a vanadium oxide, the forming of the second film includes depositing lithium phosphorus oxynitride, and the forming of the third film includes depositing a lithium intercalation material, and wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than 1000 Angstroms.
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96. A method comprising:
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providing a substrate; depositing an electrolyte second film on the first film, wherein the electrolyte second film blocks, the flow of electrons while permitting the flow of ions, and wherein the electrolyte second film includes LIPON electrolyte material deposited using an electrolyte deposition source and energized nitrogen particles from a second source such that the energized nitrogen particles provide energy to the electrolyte material during its deposition to form the electrolyte material into a desired film structure; and depositing an electrode third film on the second film, wherein the electrolyte second film is deposited to a thickness in a range of about 10 Angstroms and about 200 Angstroms. - View Dependent Claims (97, 98, 99)
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100. An apparatus comprising:
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means for providing a substrate; means for depositing an electrode first film on the substrate; means for depositing an electrolyte second film on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein the electrolyte second film includes LIPON electrolyte material deposited using an electrolyte deposition source and energized nitrogen particles from a second source such that the energized nitrogen particles provide energy to the electrolyte material during its deposition to form the electrolyte material into a desired film structure; and means for depositing an electrode third film to form a battery that includes the electrolyte second film and the electrode first film, wherein the electrolyte second film is deposited to a thickness of less than about 1000 Angstroms. - View Dependent Claims (101, 102, 103)
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Specification