Microfluidic device with controlled substrate conductivity
First Claim
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1. In a microfluidic device, a method to achieve controlled conductivity within a layer of the microfluidic device, the method comprising:
- forming a first microchannel in a first layer made of an insulating material;
forming at least one of a second microchannel and a well in the first layer; and
providing a conductive path between the first microchannel and the at least one of the second microchannel and the well by ion implanting at least one region of the first layer at or adjacent the at least one of the second microchannel and the well.
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Abstract
A method to achieve controlled conductivity in microfluidic devices, and a device formed thereby. The method comprises forming a microchannel or a well in an insulating material, and ion implanting at least one region of the insulating material at or adjacent the microchannel or well to increase conductivity of the region.
121 Citations
12 Claims
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1. In a microfluidic device, a method to achieve controlled conductivity within a layer of the microfluidic device, the method comprising:
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forming a first microchannel in a first layer made of an insulating material; forming at least one of a second microchannel and a well in the first layer; and providing a conductive path between the first microchannel and the at least one of the second microchannel and the well by ion implanting at least one region of the first layer at or adjacent the at least one of the second microchannel and the well. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification