Lithographic apparatus and device manufacturing method

• US 7,196,772 B2
• Filed: 10/26/2004
• Issued: 03/27/2007
• Est. Priority Date: 11/07/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan
• Primary Examiner(s): FULLER, RODNEY EVAN
• Application Number:
  US10/972,788
• Publication Number:
  US 20050118528A1
• Time in Patent Office: 882 Days
• Field of Search: 355/67, 355/77, 355/53, 359/260, 430/5, 430/270.1, 385/8, 250/492.3
• US Class Current: 355/67
• CPC Class Codes: G02F 1/03 based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect G02F1/061 takes precedence
• CPC Class Codes: G02F 2203/12 spatial light modulator
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

An array of individually controllable elements is comprised of elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer'"'"'s refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.

Claims

1. A lithographic apparatus, comprising:

an illumination system that produces a beam of radiation;

an array of individually controllable elements that patterns the beam; and

a projection system that projects the patterned beam onto a target portion of a substrate,

wherein each element in the array of individually controllable elements comprises a stack of top, middle, and bottom dielectric layers, at least the middle dielectric layer comprising a solid state electro-optical material, and

wherein each element is configured such that at least two layers of the electro-optical material are arranged so that their extraordinary axes are substantially mutually perpendicular.

2. The lithographic apparatus of claim 1, wherein:

during a first state of each element there is a first difference value in refractive index for one polarization state between the middle dielectric layer and the top and bottom dielectric layer; and

during a second state of each element there is a second difference value, which is smaller than the first difference value, in the refractive index for the one polarization state.

3. The lithographic apparatus of claim 1, wherein the stack further comprises:

additional layers of dielectric material, wherein at least one of the additional layers is formed from electro-optical material,

whereby a refractive index of the at least one additional layer for one polarization state is changed by applying a control signal to the middle dielectric layer of electro-optical material.

4. The lithographic apparatus of claim 3, wherein:

alternate dielectric layers of the stack are formed from material with a fixed refractive index; and

respective other layers are formed from an electro-optical material having a refractive index for a given respective polarization state that is changed by applying the control signal to each of the respective other layers.

5. The lithographic apparatus of claim 3, further comprising:

electrodes that apply an independently controllable control voltage to each layer of the electro-optical material within the stack.

6. The lithographic apparatus of claim 3, further comprising:

electrodes that apply a common control voltage to two or more layers of the electro-optical material within the stack.

7. The lithographic apparatus of claim 1, wherein each of the elements in the array of individually controllable elements controls a propagation of the radiation that is plane polarized in a first direction and, independently, a propagation of the radiation that is plane polarized in a second direction and substantially orthogonal to the first direction based on the at least two layers of the electro-optical material being arranged such that their extraordinary axes are substantially mutually perpendicular.

8. An array of individually controllable elements that pattern a beam of radiation, wherein each element in the array of individually controllable elements comprises:

top, middle, and bottom dielectric layers, at least the middle dielectric layer being formed of a solid state electro-optical material,

wherein each of the elements in the array of individually controllable elements is configured to control a propagation of the radiation that is plane polarized in a first direction and, independently, a propagation of the radiation that is plane polarized in a second direction and substantially orthogonal to the first direction.

9. The element of claim 8, wherein:

during a first state of each element there is a first difference value in refractive index for one polarization state between the middle dielectric layer and the top and bottom dielectric layers; and

during a second state of each element there is a second difference value, which is smaller than the first difference value, in the refractive index for the one polarization state.

10. The element of claim 8, wherein at least two layers of the electro-optical material are arranged such that their extraordinary axes are substantially mutually perpendicular to allow for the propagation of the radiation that is plane polarized in the first direction and, independently, the propagation of tho radiation that is plane polarized in the second direction and substantially orthogonal to the first direction.

11. A device manufacturing method, comprising:

forming each element in an array of individually controllable elements from top, middle, and bottom dielectric layers;

forming at least the middle dielectric layer from a solid state electro-optical material;

arranging extraordinary axes of at least two of the dielectric layers to be substantially mutually perpendicular to one another;

patterning a beam of radiation from an illumination source using the array of individually controllable elements; and

projecting the patterned beam onto a target portion of a substrate.

12. The method of claim 11, further comprising:

applying a control signal to each the elements to selectively switch the element between a first state and a second state, such that proportions of the radiation that are transmitted and reflected, respectively, at a boundary between the middle dielectric layer and at least one of the top or bottom dielectric layers are different in the first and second states.

13. The method of claim 12, further comprising:

during the first state there is a first difference value in refractive index for one polarization state between the middle dielectric layer and the top and bottom dielectric layers; and

during the second state there is a second difference value, which is smaller than the first difference value, in the refractive index for the one polarization state.

14. The method of claim 11, wherein each of the elements in the array of individually controllable elements controls a propagation of the radiation that is plane polarized in a first direction and, independently, a propagation of the radiation that is plane polarized in a second direction and substantially orthogonal to the first direction based on the at least two layers of the electro-optical material being arranged such that their extraordinary axes are substantially mutually perpendicular.