Lithographic apparatus and device manufacturing method
First Claim
Patent Images
1. A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a substrate table configured to hold said substrate, said substrate table comprising;
an edge seal member configured to at least partly surround an edge of said substrate, an object positioned on said substrate table, or both, anda vacuum port, or a liquid supply port, or both, positioned to provide respectively vacuum or liquid to the gap between said edge seal member and said substrate, said object, or both, on a side opposite said projection system; and
a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said projection system and said substrate, said object, or both.
1 Assignment
0 Petitions
Accused Products
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
-
Citations
29 Claims
-
1. A lithographic projection apparatus comprising:
-
a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold said substrate, said substrate table comprising; an edge seal member configured to at least partly surround an edge of said substrate, an object positioned on said substrate table, or both, and a vacuum port, or a liquid supply port, or both, positioned to provide respectively vacuum or liquid to the gap between said edge seal member and said substrate, said object, or both, on a side opposite said projection system; and a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said projection system and said substrate, said object, or both. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. A lithographic projection apparatus comprising:
-
a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, said substrate table comprising an edge seal member configured to at least partly surround an edge of a substrate, an object, or both, positioned on said substrate table and to provide a primary surface facing said projection system substantially co-planar with a primary surface of said substrate, said object, or both; and a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said projection system and said substrate, said object, or both, and to a localized area of (i) said object, (ii) said edge seal member, (iii) said substrate, or (iv) any combination of (i)–
(iii). - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
-
Specification