Lithographic apparatus and device manufacturing method

• US 7,199,858 B2
• Filed: 11/12/2003
• Issued: 04/03/2007
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Sengers, Timotheus Franciscus, Bijlaart, Erik Theodorus Maria, Meijer, Hendricus Johannes Maria, Mulkens, Johannes Catharinus Hubertus, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Streefkerk, Bob, Van Schaik, Frank, De Smit, Joannes Theodoor, Loopstra, Erik Roelof, Straaijer, Alexander, Mertens, Jeroen Johannes Sophia Maria, Lof, Joeri, Kolesnychenko, Aleksey Yurievich, Ritsema, Roelof Aeilko Siebrand, Van Santen, Helmar, Simon, Klaus, Hoogendam, Christiaan Alexander
• Primary Examiner(s): Kim; Peter B.
• Application Number:
  US10/705,804
• Publication Number:
  US 20040160582A1
• Time in Patent Office: 1,238 Days
• Field of Search: 355/55, 355/53, 355/30, 355/63, 355/72, 355/75, 355/77, 250/548, 250/492.2, 359/380
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Claims

1. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a projection system configured to project the patterned beam onto a target portion of a substrate;

a substrate table configured to hold said substrate, said substrate table comprising;

an edge seal member configured to at least partly surround an edge of said substrate, an object positioned on said substrate table, or both, and

a vacuum port, or a liquid supply port, or both, positioned to provide respectively vacuum or liquid to the gap between said edge seal member and said substrate, said object, or both, on a side opposite said projection system; and

a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said projection system and said substrate, said object, or both.

2. An apparatus according to claim 1, wherein said substrate table further comprises a channel positioned radially inwardly of said vacuum port, said channel being connected to a gas source such that on actuation of said vacuum a flow of gas radially outwardly from said channel towards said vacuum can be established.

3. An apparatus according to claim 2, wherein one or more burls configured to be in contact with said substrate, said object, or both, are present radially outwardly of said channel and inwardly of said vacuum port.

4. An apparatus according to claim 1, wherein said substrate table comprises a portion which extends below the said substrate, said object, or both, and is radially outwardly of said vacuum port.

5. An apparatus according to claim 4, wherein said portion has one or more parts which are configured to extend up to said substrate, said object, or both, to at least partly support said substrate, said object, or both.

6. An apparatus according to claim 4, wherein said portion is part of a pimple table configured to support said substrate.

7. An apparatus according to claim 1, further comprising a compartment in said substrate table in fluid connection with said gap via said vacuum port and with said vacuum.

8. An apparatus according to claim 1, wherein said vacuum port is annular.

9. An apparatus according to claim 1, wherein said vacuum port is discontinuous.

10. An apparatus according to claim 1, wherein said vacuum port is continuous.

11. An apparatus according to claim 1, wherein said vacuum port is positioned adjacent an edge portion of the edge seal member.

12. An apparatus according to claim 1, wherein said object comprises a sensor.

13. An apparatus according to claim 1, wherein said edge seal member is glued to said substrate, said object, or both, around a periphery of said substrate, said object, or both.

14. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a projection system configured to project the patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate, said substrate table comprising an edge seal member configured to at least partly surround an edge of a substrate, an object, or both, positioned on said substrate table and to provide a primary surface facing said projection system substantially co-planar with a primary surface of said substrate, said object, or both; and

a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said projection system and said substrate, said object, or both, and to a localized area of (i) said object, (ii) said edge seal member, (iii) said substrate, or (iv) any combination of (i)–

(iii).

15. An apparatus according to claim 14, wherein said edge seal member and said substrate, said object, or both, are moveably mounted relative to one another.

16. An apparatus according to claim 14, wherein said edge seal member is moveable in a plane substantially parallel to said primary surface of said edge seal member to vary the distance between said edge seal member and said substrate, said object, or both.

17. An apparatus according to claim 14, wherein said substrate table comprises an actuator configured to move said edge seal member relative to a remainder of said substrate table in a direction substantially parallel to the optical axis of the apparatus.

18. An apparatus according to claim 17, wherein said actuator comprises a wedge member which, on movement in a direction substantially parallel to said primary surface of said edge seal member, is effective to move said edge seal member relative to a remainder of said substrate table in the direction substantially parallel to the optical axis of the apparatus.

19. An apparatus according to claim 18, wherein said wedge is configured to lock in place on removal of an actuation force by virtue of the coefficient of friction of said wedge.

20. An apparatus according to claim 14, wherein said substrate table comprises a hydrophobic layer adjacent an edge portion of said edge seal member and said substrate, said object, or both, on an opposite side of said edge seal member and said substrate, said object, or both, to said projection system.

21. An apparatus according to claim 20, wherein said liquid has a contact angle of greater than 90°

with said hydrophobic layer.

22. An apparatus according to claim 14, wherein said edge seal member has a projection with a top surface co-planar with the primary surface of said edge seal member and extending towards the optical axis of said apparatus.

23. An apparatus according to claim 14, wherein said substrate table comprises a gap seal member configured to abut or at least partly overlap, in the direction of the optical axis, both said edge seal member and said substrate, said object, or both.

24. An apparatus according to claim 23, wherein said gap seal member is configured to be in contact with said primary surfaces thereby spanning a gap between said edge seal member and said substrate, said object, or both.

25. An apparatus according to claim 23, wherein said gap seal member has inner and outer edges at least one of which edges is tapered such that the distance of the surface of the gap seal member facing away from the primary surface of the edge seal member or said substrate, said object, or both, decreases towards the edge of the gap seal member.

26. An apparatus according to claim 23, wherein said substrate table comprises a vacuum port in said primary surface of said edge seal member configured to hold said gap seal member in place.

27. An apparatus according to claim 14, wherein said substrate table comprises an actuator configured to vary the distance of the primary surface of said substrate, said object, or both, relative to the remainder of said substrate table.

28. An apparatus according to claim 14, wherein said object comprises a sensor.

29. An apparatus according to claim 14, wherein said edge seal member is glued to said substrate, said object, or both, around a periphery of said substrate, said object, or both.