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Analytical reagent for acid copper sulfate solutions

  • US 7,205,153 B2
  • Filed: 04/11/2003
  • Issued: 04/17/2007
  • Est. Priority Date: 04/11/2003
  • Status: Expired due to Fees
First Claim
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1. An analytical method for determining the concentration of a component in a plating bath, comprising:

  • providing an analytical reagent solution, wherein the analytical reagent solution comprises at least one chelating agent, at least one pH buffering agent, and water;

    providing a testing solution having a portion of the plating bath therein;

    measuring a series of chemical responses of the testing solution reacting with two or more doses of the analytical reagent solution; and

    calculating the concentration of the component in the plating bath from the measurements of the series of chemical responses.

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