Analytical reagent for acid copper sulfate solutions
First Claim
1. An analytical method for determining the concentration of a component in a plating bath, comprising:
- providing an analytical reagent solution, wherein the analytical reagent solution comprises at least one chelating agent, at least one pH buffering agent, and water;
providing a testing solution having a portion of the plating bath therein;
measuring a series of chemical responses of the testing solution reacting with two or more doses of the analytical reagent solution; and
calculating the concentration of the component in the plating bath from the measurements of the series of chemical responses.
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Abstract
Embodiments of the invention provide an analytical method and analytical reagent solutions for determining the concentration of electrolyte components, such as copper, acid and chloride constituents in an acid or basic metal plating bath using a chemical analyzer. Common methods for measuring the concentration of copper general require two reagent solutions/two steps. This invention provides a novel analytical reagent solution that simplifies the chelating, buffering, and cleaning functions of separate regent solutions required for measuring electrolyte concentration. This has the benefits of reducing chemical inventory and associated dispensing equipment, and thus reducing chemical consumption.
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Citations
25 Claims
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1. An analytical method for determining the concentration of a component in a plating bath, comprising:
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providing an analytical reagent solution, wherein the analytical reagent solution comprises at least one chelating agent, at least one pH buffering agent, and water; providing a testing solution having a portion of the plating bath therein; measuring a series of chemical responses of the testing solution reacting with two or more doses of the analytical reagent solution; and calculating the concentration of the component in the plating bath from the measurements of the series of chemical responses. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. An analytical method for determining the concentration of a component in a plating bath, comprising:
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providing an analytical reagent solution, wherein the analytical reagent solution comprises, at least one chelating agent selected from the group consisting of ethelenediaminetetraacetic acid (H4EDTA), ethelenediaminetetraacetic acid salts, ethelenediaminetetraacetic acid disodium salt (Na2 H2EDTA), tetrasodium ethelenediaminetetraacetic acid (Na4EDTA), magnesium disodium ethelenediaminetetraacetic acid (MgNa2EDTA), cyclohexanediaminetetraacetic acid (CDTA), N-2-hydroxyethyl-ethylenediamine-N,N,N′
-triacetic acid tri sodium salt (HEDTA), triethylene tetramine hexaacetic acid (TTHA), nitrilotriacetic acid (NTA), derivatives, hydrates, anhydrates, metal salts, and combinations thereof;at least one pH buffering agent selected from the group consisting of ammonia, ammonia chloride, a hydroxide salt solution, sodium hydroxide, ammonium hydroxide, magnesium hydroxide, and calcium hydroxide, and combinations thereof, in an amount sufficient to adjust the pH of the analytical reagent solution to a range of from about 7 to about 10; and water; providing a testing solution having a portion of the plating bath therein; measuring a series of chemical responses of the testing solution reacting with two or more doses of the analytical reagent solution; and calculating the concentration of the component in the plating bath from the measurements of the series of chemical responses. - View Dependent Claims (13, 14, 15)
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16. An analytical method for determining the concentration of a component in a plating bath, comprising:
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combining two or more reagent solutions for at least one chelating and at least one buffering into one analytical reagent solution, wherein the analytical reagent solution comprises; at least one chelating agent selected from the group consisting of ethelenediaminetetraacetic acid (H4EDTA), ethelenediaminetetraacetic acid salts, ethelenediaminetetraacetic acid disodium salt (Na2 H2EDTA), tetrasodium ethelenediaminetetraacetic acid (Na4EDTA), magnesium disodium ethelenediaminetetraacetic acid (MgNa2EDTA), cyclohexanediaminetetraacetic acid (CDTA), N-2-hydroxyethyl-ethylenediamine-N,N,N′
-triacetic acid tri sodium salt (HEDTA), triethylene tetramine hexaacetic acid (TTHA), nitrilotriacetic acid (NTA), derivatives, hydrates, anhydrates, metal salts, and combinations thereof;a pH buffering agent selected from the group consisting of ammonia, ammonia chloride, a hydroxide salt solution, sodium hydroxide, ammonium hydroxide, magnesium hydroxide, and calcium hydroxide, and combinations thereof, in an amount sufficient to adjust the pH of the analytical reagent solution to a range of from about 7 to about 10; and water; and performing an analytical technique for a portion of the plating bath using the analytical reagent solution to determine the concentration of the component. - View Dependent Claims (17, 18, 19)
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20. An analytical method for determining the concentration of a component in a plating bath, comprising:
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providing a testing solution having a portion of the plating bath therein; adding a pre-dose volume of an analytical reagent solution to react with the testing solution; adding one or more doses of a second volume of the analytical reagent solution to react with the testing solution; measuring a series of chemical responses of the testing solution reacting with the analytical reagent solution; obtaining an endpoint dose; and calculating the concentration of the component in the plating bath from the measurements of the series of chemical responses and the endpoint dose, wherein the analytical reagent solution comprises; at least one chelating agent selected from the group consisting of ethelenediaminetetraacetic acid (H4EDTA), ethelenediaminetetraacetic acid salts, ethelenediaminetetraacetic acid disodium salt (Na2 H2EDTA), tetrasodium ethelenediaminetetraacetic acid (Na4EDTA), magnesium disodium ethelenediaminetetraacetic acid (MgNa2EDTA), cyclohexanediaminetetraacetic acid (CDTA), N-2-hydroxyethyl-ethylenediam me-N,N,N′
-triacetic acid tri sodium salt (HEDTA), triethylene tetramine hexaacetic acid (TTHA), nitrilotriacetic acid (NTA), derivatives, hydrates, anhydrates, metal salts, and combinations thereof;at least one pH buffering agent selected from the group consisting of ammonia, ammonia chloride, a hydroxide salt solution, sodium hydroxide, ammonium hydroxide, magnesium hydroxide, and calcium hydroxide, and combinations thereof, in an amount sufficient to adjust the pH of the analytical reagent solution to a range of from about 7 to about 10; and water. - View Dependent Claims (21, 22, 23, 24, 25)
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Specification