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Off-axis levelling in lithographic projection apparatus

  • US 7,206,058 B2
  • Filed: 01/04/2006
  • Issued: 04/17/2007
  • Est. Priority Date: 03/08/1999
  • Status: Expired due to Fees
First Claim
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1. A lithographic projection apparatus comprising:

  • a radiation system constructed and arranged to condition a beam of radiation including an EUV radiation;

    a patterning device support constructed and arranged to support a patterning device, said patterning device being configured to pattern the beam of radiation including the EUV radiation to form a patterned beam of radiation;

    a substrate support constructed and arranged to hold a substrate;

    an exposure station having a projection system configured to project the patterned beam of radiation including the EUV radiation onto target portions of the substrate;

    a sensor constructed and arranged to measure a position of each of a plurality of points on a surface of said patterning device in a first direction perpendicular to said surface so as to generate a height map of said surface of said patterning device; and

    a controller configured to control a tilt of said patterning device support about at least one direction substantially perpendicular to said first direction based on said height map.

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