Apparatus and method for measuring spectral reflectance and apparatus for measuring film thickness

• US 7,206,074 B2
• Filed: 02/15/2005
• Issued: 04/17/2007
• Est. Priority Date: 03/19/2004
• Status: Expired due to Fees

• Current Assignee: SCREEN Holdings Co., Ltd.
• Original Assignee: Dainippon Screen Manufacturing Company Limited (SCREEN Holdings Co., Ltd.)
• Inventors: Nishihara, Eiji, Kondo, Noriyuki, Fujimoto, Hiroki
• Primary Examiner(s): Toatley, Jr.; Gregory J.
• Assistant Examiner(s): CONNOLLY, PATRICK J
• Application Number:
  US11/057,216
• Publication Number:
  US 20050206907A1
• Time in Patent Office: 791 Days
• Field of Search: 356/454, 356/456, 356/503, 356630-632
• US Class Current: 356/456
• CPC Class Codes: G01B 11/0625 with measurement of absorption or reflection

Abstract

A film thickness measurement apparatus has an image pickup part (32) for acquiring a plurality of single-band images corresponding to a plurality of wavelengths, and the image pickup part (32) acquires a plurality of reference single-band images representing a pattern on a reference substrate. A correction factor setting part (51) performs setting of a plurality of correction factors in accordance with distances from a specified pixel by using a plurality of reference single-band images. Subsequently, the image pickup part (32) acquires a plurality of measurement single-band images representing a pattern on an objective substrate and corrects a value of the specified pixel for each of a plurality of measurement single-band images by using the value of the specified pixel and values of pixels surrounding the specified pixel and the correction factors. A spectral reflectance calculation part (52) thereby calculates a reflectance at a measurement point on the objective substrate which corresponds to the specified pixel on the basis of the corrected value of the specified pixel with high accuracy.

Claims

1. A spectral reflectance measurement apparatus for measuring spectral reflectance of a measurement object, comprising:

an image pickup part for picking up an image of an object to acquire a plurality of single-band images corresponding to a plurality of wavelengths;

a correction factor setting part for setting a plurality of correction factors in accordance with distances from a specified pixel by using a plurality of reference single-band images of a reference object which are acquired by said image pickup part; and

a spectral reflectance calculation part for obtaining a corrected value of a specified pixel for each of a plurality of measurement single-band images of a predetermined area on a measurement object which are acquired by said image pickup part, by using a value of said specified pixel, values of pixels surrounding said specified pixel and said plurality of correction factors and calculating a reflectance of a position on said measurement object which corresponds to said specified pixel on the basis of said corrected value.

2. The spectral reflectance measurement apparatus according to claim 1, wherein said correction factor setting part comprises a correction factor calculation part for performing calculation to obtain said plurality of correction factors, where it is assumed, in each of said plurality of reference single-band images, that said plurality of correction factors are unknown, by substantially multiplying each of an already-known corrected value of said specified pixel and values of pixels surrounding said specified pixel by one of said plurality of correction factors to obtain an equation where the sum of a plurality of multiplication results is assumed to be a value of said specified pixel and then solving simultaneous equations obtained from said plurality of reference single-band images.

3. The spectral reflectance measurement apparatus according to claim 1, wherein said plurality of reference single-band images are images representing a predetermined pattern on said reference object in different wavelengths and said plurality of measurement single-band images represent said predetermined pattern.

4. The spectral reflectance measurement apparatus according to claim 1, wherein said plurality of reference single-band images are images representing different patterns in one wavelength and said correction factor setting part performs setting of said plurality of correction factors for each wavelength, and

said spectral reflectance calculation part selects correction factors to be used in calculation in accordance with the wavelength of a measurement single-band image.

5. The spectral reflectance measurement apparatus according to claim 4, wherein a plurality of images obtained with a position of one pattern changed are included in said plurality of reference single-band images.

6. The spectral reflectance measurement apparatus according to claim 1, wherein values of a plurality of pixels which are present at the same distance away from said specified pixel are replaced by one representative value to be used in said correction factor setting part and said spectral reflectance calculation part.

7. The spectral reflectance measurement apparatus according to claim 1, further comprising:

a light source for emitting light of multiple wavelengths;

an optical system for guiding light from said light source onto an object and guiding light reflected on said object to said image pickup part; and

a filter unit having a plurality of filters for transmitting lights of a plurality of different wavelengths, where one of said plurality of filters is selectively disposed on an optical path leading from said light source to an object.

8. A film thickness measurement apparatus for measuring the thickness of a film formed on a measurement object, comprising:

an image pickup part for picking up an image of an object to acquire a plurality of single-band images corresponding to a plurality of wavelengths;

a moving mechanism for moving an object relatively to said image pickup part;

a control part for controlling said moving mechanism on the basis of an image acquired by said image pickup part;

a correction factor setting part for setting a plurality of correction factors in accordance with distances from a specified pixel by using a plurality of reference single-band images of a reference object which are acquired by said image pickup part;

a spectral reflectance calculation part for obtaining a corrected value of a specified pixel for each of a plurality of measurement single-band images of a predetermined area on a measurement object which are acquired by said image pickup part, by using a value of said specified pixel, values of pixels surrounding said specified pixel and said plurality of correction factors and calculating a reflectance of a position on said measurement object which corresponds to said specified pixel on the basis of said corrected value; and

a film thickness calculation part for calculating the thickness of a film formed on said measurement object on the basis of reflectances obtained by said spectral reflectance calculation part.

9. The film thickness measurement apparatus according to claim 8, wherein said correction factor setting part comprises a correction factor calculation part for performing calculation to obtain said plurality of correction factors, where it is assumed, in each of said plurality of reference single-band images, that said plurality of correction factors are unknown, by substantially multiplying each of an already-known corrected value of said specified pixel and values of pixels surrounding said specified pixel by one of said plurality of correction factors to obtain an equation where the sum of a plurality of multiplication results is assumed to be a value of said specified pixel and then solving simultaneous equations obtained from said plurality of reference single-band images.

10. The film thickness measurement apparatus according to claim 8, wherein said plurality of reference single-band images are images representing a predetermined pattern on said reference object in different wavelengths and said plurality of measurement single-band images represent said predetermined pattern.

11. The film thickness measurement apparatus according to claim 8, wherein said plurality of reference single-band images are images representing different patterns in one wavelength and said correction factor setting part performs setting of said plurality of correction factors for each wavelength, and

said spectral reflectance calculation part selects correction factors to be used in calculation in accordance with the wavelength of a measurement single-band image.

12. The film thickness measurement apparatus according to claim 11, wherein a plurality of images obtained with a position of one pattern changed are included in said plurality of reference single-band images.

13. The film thickness measurement apparatus according to claim 8, wherein values of a plurality of pixels which are present at the same distance away from said specified pixel are replaced by one representative value to be used in said correction factor setting part and said spectral reflectance calculation part.

14. The film thickness measurement apparatus according to claim 8, further comprising:

a light source for emitting light of multiple wavelengths;

an optical system for guiding light from said light source onto an object and guiding light reflected on said object to said image pickup part; and

a filter unit having a plurality of filters for transmitting lights of a plurality of different wavelengths, where one of said plurality of filters is selectively disposed on an optical path leading from said light source to an object.

15. A spectral reflectance measurement method for measuring spectral reflectance of a measurement object, comprising the steps of:

picking up images of a reference object to acquire a plurality of reference single-band images;

setting a plurality of correction factors in accordance with distances from a specified pixel by using said plurality of reference single-band images;

picking up images of a predetermined area on a measurement object to acquire a plurality of measurement single-band images corresponding to a plurality of wavelengths;

obtaining a corrected value of a specified pixel for each of said plurality of measurement single-band images by using a value of said specified pixel, values of pixels surrounding said specified pixel and said plurality of correction factors; and

calculating a reflectance of a position on said measurement object which corresponds to said specified pixel on the basis of said corrected value, the calculated reflectance being stored on a computer medium.

16. The spectral reflectance measurement method according to claim 15, wherein said plurality of correction factors are calculated, where it is assumed, in each of said plurality of reference single-band images, that said plurality of correction factors are unknown, by substantially multiplying each of an already-known corrected value of said specified pixel and values of pixels surrounding said specified pixel by one of said plurality of correction factors to obtain an equation where the sum of a plurality of multiplication results is assumed to be a value of said specified pixel and then solving simultaneous equations obtained from said plurality of reference single-band images in said step of setting a plurality of correction factors.

17. The spectral reflectance measurement method according to claim 15, wherein said plurality of reference single-band images are images representing a predetermined pattern on said reference object in different wavelengths and said plurality of measurement single-band images represent said predetermined pattern.

18. The spectral reflectance measurement method according to claim 15, wherein said plurality of reference single-band images are images representing different patterns in one wavelength and said step of setting a plurality of correction factors is executed for each wavelength, and

correction factors to be used in calculation are selected in accordance with the wavelength of a measurement single-band image in said step of calculating a reflectance.

19. The spectral reflectance measurement method according to claim 18, wherein a plurality of images obtained with a position of one pattern changed are included in said plurality of reference single-band images.

20. The spectral reflectance measurement method according to claim 15, wherein values of a plurality of pixels which are present at the same distance away from said specified pixel are replaced by one representative value to be used in said steps of setting a plurality of correction factors and calculating a reflectance.