Wafer-based planning methods and systems for batch-based processing tools

• US 7,206,653 B1
• Filed: 11/29/2005
• Issued: 04/17/2007
• Est. Priority Date: 11/29/2005
• Status: Expired due to Fees

• Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Original Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Inventors: Chang, Chao-Fan, Ou, Ming-Feng, Fang, Gwo-Chiang, Wu, Oliver, Chen, Ju-Kau
• Primary Examiner(s): VON BUHR, MARIA N
• Application Number:
  US11/288,489
• Time in Patent Office: 504 Days
• Field of Search: 700 28- 30, 700 95- 97, 700 99-101, 700117-121
• US Class Current: 700/99
• CPC Class Codes: G06Q 10/06 Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling

Abstract

Computer-implemented wafer-based planning methods for batch-based processing tools. Tool groups are appended in a tool group level of planning data provided by a MES for converting planning data from batch-based to wafer-based data. The planning data with appended tool group is applied to dispatch processing tools.

Claims

1. A computer-implemented wafer-based planning method for batch-based processing tools, comprising:

providing planning data, comprising an operations level, a tool group set level, a tool group level, and a tool level, wherein the operations level comprises at least one operation and each operation corresponds to one tool group set in the tool group set level, one tool group in the tool group level, and one batch-based processing tool in the tool level; and

appending at least one tool group to the tool group level for each operation in the operations level, wherein the number of appended tool groups depends on the wafer capacity of the batch-based processing tool.

2. The computer-implemented wafer-based planning method for batch-based processing tools of claim 1, further appending tool group selection rules corresponding to the appended tool groups.

3. The computer-implemented wafer-based planning method for batch-based processing tools of claim 2, wherein when wafers arrive at the batch-based processing tool, a target tool group is selected from the tool groups from the tool group level according to the number of wafers and the tool group selection rules.

4. The computer-implemented wafer-based planning method for batch-based processing tools of claim 1, wherein the planning data is provided by a manufacturing execution system for the batch-based processing tools.

5. The computer-implemented wafer-based planning method for batch-based processing tools of claim 1, wherein the planning data with the appended tool groups is provided to the batch-based processing tools for wafer dispatch.

6. The computer-implemented wafer-based planning method for batch-based processing tools of claim 1, wherein the appended tool groups are indexed from one to the maximum wafer capacity of the batch-based processing tool.

7. A wafer-based planning system for batch-based processing tools, comprising:

a database providing planning data comprising an operations level, a tool group set level, a tool group level, and a tool level, wherein the operations level comprises at least one operation and each operation corresponds to one tool group set in the tool group set level, one tool group in the tool group level, and one batch-based processing tool in the tool level; and

an appending module, coupled to the database, appending at least one tool group to the tool group level for each operation in the operations level, wherein the number of the appended tool groups depends on the wafer capacity of the batch-based processing tool.

8. The wafer-based planning system for batch-based processing tools of claim 7, wherein the appending module further appends tool group selection rules corresponding to the appended tool groups.

9. The wafer-based planning system for batch-based processing tools of claim 8, wherein when wafers arrive at the batch-based processing tool, a target tool group is selected from the tool groups according to the number of wafers and the tool group selection rules.

10. The wafer-based planning system for batch-based processing tools of claim 7, wherein the database is provided by a manufacturing execution system for the batch-based processing tools.

11. The wafer-based planning system for batch-based processing tools of claim 7, wherein the planning data with the appended tool groups is provided to the batch-based processing tools for wafer dispatch.

12. The wafer-based planning system for batch-based processing tools of claim 7, wherein the appended tool groups are indexed from one to the maximum wafer capacity of the batch-based processing tool.

13. An integrated circuit product manufactured by a computer-implemented wafer-based planning method for batch-based processing tools, the method comprising:

providing planning data, comprising an operations level, a tool group set level, a tool group level, and a tool level, wherein the operations level comprises at least one operation and each operation corresponds to one tool group set in the tool group set level, one tool group in the tool group level, and one batch-based processing tool in the tool level; and

appending at least one tool group to the tool group level for each operation in the operations level, wherein the number of the appended tool groups depends on the wafer capacity of the batch-based processing tool.

14. The integrated circuit product manufactured by a computer-implemented wafer-based planning method for batch-based processing tools of claim 13, the method further appending tool group selection rules corresponding to the appended tool groups.

15. The integrated circuit product manufactured by a computer-implemented wafer-based planning method for batch-based processing tools of claim 14, wherein when wafers arrive at the batch-based processing tool, a target tool group is selected from the tool groups according to the number of wafers and the tool group selection rules.

16. The integrated circuit product manufactured by a computer-implemented wafer-based planning method for batch-based processing tools of claim 13, wherein the planning data is provided by a manufacturing execution system for the batch-based processing tools.

17. The integrated circuit product manufactured by a computer-implemented wafer-based planning method for batch-based processing tools of claim 13, wherein the planning data with the appended tool groups is provided to the batch-based processing tools for wafer dispatch.

18. The integrated circuit product manufactured by a computer-implemented wafer-based planning method for batch-based processing tools of claim 13, wherein the appended tool groups are indexed from one to the maximum wafer capacity of the batch-based processing tool.