Growth of planar reduced dislocation density m-plane gallium nitride by hydride vapor phase epitaxy
First Claim
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1. A method of growing planar m-plane gallium nitride (GaN) films, comprising:
- (a) performing a direct growth of a planar m-plane GaN film by hydride vapor phase epitaxy; and
(b) performing a lateral epitaxial overgrowth (LEO) off of a surface of the direct growth resulting in a top surface that is a planar m-plane GaN film.
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Abstract
A method of growing highly planar, fully transparent and specular m-plane gallium nitride (GaN) films. The method provides for a significant reduction in structural defect densities via a lateral overgrowth technique. High quality, uniform, thick m-plane GaN films are produced for use as substrates for polarization-free device growth.
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19 Claims
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1. A method of growing planar m-plane gallium nitride (GaN) films, comprising:
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(a) performing a direct growth of a planar m-plane GaN film by hydride vapor phase epitaxy; and (b) performing a lateral epitaxial overgrowth (LEO) off of a surface of the direct growth resulting in a top surface that is a planar m-plane GaN film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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