Lithographic apparatus and device manufacturing method utilizing plural patterning devices
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that supplies a beam of radiation;
a dividing system configured to divide the beam of radiation into portions;
a patterning system that comprises at least two arrays of individually controllable elements arranged to be illuminated by the respective portions of the beam, each of the arrays patterning the respective portion of the beam;
a combining system configured to combine the patterned portions of the beam into a patterned beam;
a directing device that directs each of the portions between (a) the dividing system and respective ones of the at least two arrays of individually controllable elements and (b) the respective ones of the at least two arrays of individually controllable elements and the combining system; and
a projection system that projects the patterned beam onto a target portion of a substrate.
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Abstract
A lithographic apparatus includes an illumination system, a patterning system, a projection system, and a combining system. The illumination system supplies a beam of radiation. The patterning system patterns the beam. The patterning system includes at least two arrays of individually controllable elements arranged to be illuminated by respective portions of the beam, each of the arrays pattering the respective portion of the beam. The combining system combines the patterned portions into the patterned beam. The projection system projects the patterned beam onto a target portion of a substrate.
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Citations
22 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a beam of radiation; a dividing system configured to divide the beam of radiation into portions; a patterning system that comprises at least two arrays of individually controllable elements arranged to be illuminated by the respective portions of the beam, each of the arrays patterning the respective portion of the beam; a combining system configured to combine the patterned portions of the beam into a patterned beam; a directing device that directs each of the portions between (a) the dividing system and respective ones of the at least two arrays of individually controllable elements and (b) the respective ones of the at least two arrays of individually controllable elements and the combining system; and a projection system that projects the patterned beam onto a target portion of a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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7. The apparatus of 1, wherein the dividing system comprises at least one prism.
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8. The apparatus of 1, wherein the dividing system comprises:
a plurality of beam dividing elements arranged as a branching network, the branching network being arranged to receive the beam, to divide the beam into the portions, and to direct each of the portions to a respective one of the arrays. - View Dependent Claims (9)
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22. A device manufacturing method, comprising:
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dividing a beam of radiation into portions using a dividing device; directing the portions onto first and second corresponding arrays of individually controllable elements using a directing device; patterning respective ones of the portions with the first and second corresponding arrays of individually controllable elements; directing the patterned portions towards a combining device using the directing device; combining the patterned portions into a patterned beam using the combining device; and projecting the patterned beam onto a target portion of a substrate.
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Specification