Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation

• US 7,209,275 B2
• Filed: 06/30/2005
• Issued: 04/24/2007
• Est. Priority Date: 06/30/2005
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Baselmans, Johannes Jacobus Matheus, Latypov, Azat M., Troost, Kars Z.
• Primary Examiner(s): Mack; Ricky
• Assistant Examiner(s): TRA, TUYEN Q
• Application Number:
  US11/170,065
• Publication Number:
  US 20070002419A1
• Time in Patent Office: 663 Days
• Field of Search: 359/290, 359/291, 359/237, 359/223, 359/224, 359/578, 359/318, 359/281, 359/285, 359/855, 355/67, 355/52, 355/53, 355/55, 355/69, 355/77, 430/5, 430/20, 430/30
• US Class Current: 359/237
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.

Claims

1. A method for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate, comprising:

selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels;

wherein at least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel;

forming an interpolation table to tabulate pre-calculated pixel modulation states; and

determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table.

2. The method of claim 1, wherein the modulation states include mirror deflection settings.

3. The method of claim 2, wherein the deflection settings include mirror tilt angle.

4. The method of claim 2, wherein the deflection settings include piston settings.

5. The method of claim 1, wherein the at least two pixels are adjacent.

6. The method of claim 1, wherein the super pixel includes at least 4 adjacent pixels sharing a common corner.

7. The method of claim 1, wherein the boundary is a pixel boundary.

8. The method of claim 1, wherein the pre-calculated pixel modulation states are based upon a plurality of edge positions, each edge of the plurality being defined by respective slope and position parameters.

9. The method of claim 8, wherein the respective slope and position parameters are determined in accordance with an off-line optimization routine.

10. The method of claim 9, wherein the respective slope and position parameters are determined by (i) examining all possible pixel state combination within the super-pixel and (ii) selecting combinations corresponding to predetermined generic pattern fragments.

11. The method of claim 1, wherein the pixel modulation states are selected from the interpolation table.

12. The method of claim 1, wherein the pixel modulation states are interpolated from the tabulated slope and position parameters of the interpolation table.

13. An apparatus for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate, comprising:

means for selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels;

wherein at least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel;

means for forming an interpolation table to tabulate pre-calculated pixel modulation states; and

means for determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table.

14. The apparatus of claim 13, wherein the at least one edge intersects another edge within the super-pixel;

and

wherein the at least one edge and the other edge continue outside of the super-pixel within the object plane.