Method and system of discriminating substrate type
First Claim
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1. A method for determining a substrate type comprising:
- disposing said substrate in a plasma processing system;
exposing said substrate to a plasma process in said plasma processing system;
detecting an optical signal resulting from an optical emission spectrum of said plasma process performed on said substrate, said optical signal including an intensity ratio of a first intensity corresponding to a first wavelength band to a second intensity corresponding to a second wavelength band; and
determining whether said substrate type is a correct substrate type or an incorrect substrate type by comparing said optical signal with a threshold value,said threshold value comprises setting said threshold value to an average of an intensity ratio corresponding to the incorrect substrate type and an intensity ratio corresponding to the correct substrate type.
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Abstract
A method and system for determining a substrate type during a seasoning process is presented. An optical signal is acquired from a process in a plasma processing system, and the optical signal is compared to a pre-determined threshold value. Depending upon the comparison, the substrate type is determined to be of a correct type, or an incorrect type.
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Citations
8 Claims
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1. A method for determining a substrate type comprising:
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disposing said substrate in a plasma processing system; exposing said substrate to a plasma process in said plasma processing system; detecting an optical signal resulting from an optical emission spectrum of said plasma process performed on said substrate, said optical signal including an intensity ratio of a first intensity corresponding to a first wavelength band to a second intensity corresponding to a second wavelength band; and determining whether said substrate type is a correct substrate type or an incorrect substrate type by comparing said optical signal with a threshold value, said threshold value comprises setting said threshold value to an average of an intensity ratio corresponding to the incorrect substrate type and an intensity ratio corresponding to the correct substrate type. - View Dependent Claims (2, 3, 4, 5, 6, 8)
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7. A method for determining a substrate type comprising:
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disposing said substrate in a plasma processing system; exposing said substrate to a seasoning process in said plasma processing system; detecting an optical signal resulting from an optical emission spectrum of said process using optical emission spectroscopy, wherein said optical signal comprises an intensity ratio of a first intensity corresponding to a first wavelength band to a second intensity corresponding to a second wavelength band; and determining whether said substrate is a correct substrate type or an incorrect substrate type by comparing said optical signal with a threshold value, wherein said threshold value is set to an average value between an intensity ratio for the correct substrate type and an intensity ratio for the incorrect substrate type.
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Specification