Monolithic waveguide arrays

• US 7,212,723 B2
• Filed: 02/16/2006
• Issued: 05/01/2007
• Est. Priority Date: 02/19/2005
• Status: Expired due to Fees

• Current Assignee: The Board of Regents of the University of Colorado (University of Colorado System)
• Original Assignee: The Board of Regents of the University of Colorado (University of Colorado System)
• Inventors: Moore, Eric D., McLeod, Robert R.
• Primary Examiner(s): Font; Frank G.
• Assistant Examiner(s): Hughes; James P.
• Application Number:
  US11/357,737
• Publication Number:
  US 20060193579A1
• Time in Patent Office: 439 Days
• Field of Search: 383/147, 264/1.24, 264/1.27, 264/401, 264/405, 264/477, 264/494
• US Class Current: 385/147
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method
• CPC Class Codes: G02B 6/138 by using polymerisation

Abstract

A waveguide array is fabricated by providing a photoreactive material and generating an optical intensity pattern corresponding to a geometry of the waveguide array. A relative translation of the photoreactive material is effected through the optical intensity pattern. Thereafter, the photoreactive material is rendered substantially unreactive to light at at least a wavelength of the optical intensity pattern.

Claims

1. A method of fabricating a waveguide array, the method comprising:

providing a photoreactive material;

generating an optical intensity pattern corresponding to a geometry of the waveguide array;

effecting a relative translation of the photoreactive material through the optical intensity pattern; and

thereafter, rendering the photoreactive material substantially unreactive to light at at least a wavelength of the optical intensity pattern.

2. The method recited in claim 1 wherein rendering the photoreactive material substantially unreactive to light comprises exposing the photoreactive material to a substantially uniform light.

3. The method recited in claim 1 wherein rendering the photoreactive material substantially unreactive to light comprises thermally annealing the photoreactive material.

4. The method recited in claim 1 wherein the photoreactive material comprises a photoreactive polymer precursor.

5. The method recited in claim 1 wherein generating the optical intensity pattern comprises:

illuminating the photoreactive material with a first set of mutually coherent waves focused onto a portion of a plane passing through the photoreactive material; and

illuminating the portion of the plane with a second set of mutually coherent waves, wherein the second set of waves is incoherent with the first set of waves to generate an interference pattern in the portion of the plane.

6. The method recited in claim 5 further comprising illuminating the portion of the plane with a third set of mutually coherent waves, wherein the third set of waves is incoherent with the first set of waves and incoherent with the second set of waves.

7. The method recited in claim 1 wherein generating the optical intensity pattern comprises:

generating light with an illumination source;

filtering the generated light with a mask having a portion substantially opaque to a wavelength reactive with the photoreactive material and a portion substantially transparent to the wavelength; and

focusing the filtered light within the photoreactive material as the optical intensity pattern.

8. The method recited in claim 7 wherein the mask is disposed to generate the optical intensity pattern in a focal plane substantially parallel to a direction of the relative translation.

9. The method recited in claim 7 wherein the mask is disposed to generate the optical intensity pattern in a focal plane substantially perpendicular to a direction of the relative translation.

10. The method recited in claim 7 wherein the generated light is spatially incoherent.

11. The method recited in claim 1 wherein:

generating the optical intensity pattern comprises;

generating a first optical intensity pattern corresponding to a geometry of a first subset of the waveguide array; and

generating a second optical intensity pattern corresponding to a geometry of a second subset of the waveguide array, wherein the second subset is different from the first subset; and

effecting the relative translation of the photoreactive material through the optical intensity pattern comprises;

effecting a first relative translation of the photoreactive material through the first optical intensity pattern before generating the second optical intensity pattern; and

effecting a second relative translation of the photoreactive material through the second optical intensity pattern after generating the second optical intensity pattern.

12. The method recited in claim 1 wherein:

generating the optical intensity pattern comprises generating a separate optical intensity pattern for each waveguide comprised by the waveguide array; and

effecting the relative translation of the photoreactive material through the optical intensity pattern comprises effecting a separate relative translation of the photoreactive material through each separate optical intensity pattern.

13. The method recited in claim 1 wherein generating the optical intensity pattern comprises:

filling a chamber with the photoreactive material; and

exposing the photoreactive material to light through a photomask in contact with the photoreactive material.

14. The method recited in claim 1 wherein effecting the relative translation of the photoreactive material through the intensity pattern comprises:

maintaining the optical intensity pattern in a substantially fixed spatial location; and

moving the photoreactive material through the fixed spatial location.

15. The method recited in claim 14 wherein moving the photoreactive material through the fixed spatial location comprises:

providing the photoreactive material in a structure substantially transparent at a wavelength reactive with the photoreactive material; and

moving the structure.

16. The method recited in claim 15 wherein moving the structure comprises moving the structure through an oil immersion chamber filled with oil having a refractive index similar to a refractive index of the photoreactive material.

17. The method recited in claim 1 wherein effecting the relative translation of the photoreactive material through the optical intensity pattern comprises moving the optical intensity pattern.

18. The method recited in claim 1 further comprising changing the optical intensity pattern while effecting the relative translation of the photoreactive material through the optical intensity pattern.

19. The method recited in claim 18 wherein changing the optical intensity pattern comprises changing an energy density of the optical intensity pattern.

20. The method recited in claim 18 wherein changing the optical intensity pattern comprises rotating the optical intensity pattern relative to the photoreactive material.

21. The method recited in claim 18 wherein changing the optical intensity pattern comprises changing a size and/or shape of the optical intensity pattern.

22. The method recited in claim 1 wherein effecting the relative translation of the photoreactive material through the optical intensity pattern comprises changing a translation speed of the photoreactive material relative to the optical intensity pattern.

23. The method recited in claim 1 further comprising rotating the photoreactive material relative to the optical intensity pattern while effecting the relative translation of the photoreactive material through the optical intensity pattern.

24. The method recited in claim 1 wherein a refractive index of the photoreactive material increases at locations of exposure to light of a defined wavelength.

25. The method recited in claim 24 wherein the refractive index of the photoreactive material increases with an energy density of the exposure to light of the defined wavelength.

26. The method recited in claim 25 wherein the refractive index of the photoreactive material increases approximately linearly with the energy density of the exposure to light of the defined wavelength.

27. A waveguide array fabricated according to the method of claim 1.

28. A method of fabricating a waveguide array, the method comprising:

providing a photoreactive polymer precursor in a structure substantially transparent at a wavelength reactive with the photoreactive polymer precursor;

generating light with a spatially incoherent light source;

filtering the generated light with a mask having a portion substantially opaque to the wavelength and a portion substantially transparent to the wavelength;

focusing the filtered light within the photoreactive polymer precursor as an optical intensity pattern;

maintaining the optical intensity pattern in a substantially fixed spatial location;

moving the structure to translate the photoreactive polymer precursor through the fixed spatial location; and

thereafter, exposing the photoreactive polymer precursor to a substantially uniform light to cure the photoreactive polymer precursor.

29. The method recited in claim 28 wherein the mask is disposed to generate the optical intensity pattern substantially parallel to a direction of translation of the photoreactive polymer precursor.

30. The method recited in claim 28 wherein the mask is disposed to generate the optical intensity pattern substantially perpendicular to a direction of translation of the photoreactive polymer precursor.

31. The method recited in claim 28 further comprising changing the optical intensity pattern while moving the structure.

32. The method recited in claim 28 further comprising rotating the structure to rotate the photoreactive polymer precursor while moving the structure.

33. A waveguide array fabricated according to the method of claim 28.