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Method of forming thin film pattern, method of manufacturing device, electro-optical apparatus and electronic apparatus

  • US 7,214,617 B2
  • Filed: 03/18/2004
  • Issued: 05/08/2007
  • Est. Priority Date: 04/01/2003
  • Status: Expired due to Fees
First Claim
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1. A method of forming a thin film pattern by placing a functional liquid on a substrate, comprising:

  • a bank formation step of forming banks in accordance with the thin film pattern on the substrate;

    a residue processing step of removing residue between the banks; and

    a material placement step of placing the functional liquid between the banks removed the residue,wherein the residue processing step comprises a photo irradiation processing step.

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