Lithographic apparatus and device manufacturing method
First Claim
1. A system for manufacturing a device, comprising:
- means for patterning each of a plurality of beams using arrays of individually controllable elements;
means for projecting the patterned beams onto a substrate; and
means for displacing the substrate relative to the patterned beams, such that the patterned beams are scanned across the substrate in a predetermined scanning direction; and
means for directing the patterned beams towards the substrate using an array of lenses arranged such that each lens directs a respective part of a respective patterned beam towards a respective target area on the substrate,means for arranging the projecting means in groups, such that each of the lenses in the arrays of lenses of different ones of the projecting means groups direct parts of different ones of the patterned beams to different areas of the substrate that are aligned in the scanning direction; and
means for spacing the projecting means groups apart in the scanning direction, such that each of the projecting means groups scans the patterned beams across the areas of the substrate as the substrate and the projection systems are displaced relative to each other, the respective areas scanned by the patterned beams from the projecting means groups that are adjacent to each other in the scanning direction are contiguous.
1 Assignment
0 Petitions
Accused Products
Abstract
Provided is an apparatus including an array of individually controllable elements and a plurality of projection systems that project respective ones of patterned beams onto a substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction. The projection systems are arranged in groups, such that lenses in the array of lenses of different groups direct parts of different ones of the patterned beams to different ones of the respective target areas of the substrate that are aligned in the scanning direction. The groups are spaced apart in the scanning direction, wherein each group scans the respective ones of the patterned beams across a respective area of the substrate.
-
Citations
12 Claims
-
1. A system for manufacturing a device, comprising:
-
means for patterning each of a plurality of beams using arrays of individually controllable elements; means for projecting the patterned beams onto a substrate; and means for displacing the substrate relative to the patterned beams, such that the patterned beams are scanned across the substrate in a predetermined scanning direction; and means for directing the patterned beams towards the substrate using an array of lenses arranged such that each lens directs a respective part of a respective patterned beam towards a respective target area on the substrate, means for arranging the projecting means in groups, such that each of the lenses in the arrays of lenses of different ones of the projecting means groups direct parts of different ones of the patterned beams to different areas of the substrate that are aligned in the scanning direction; and means for spacing the projecting means groups apart in the scanning direction, such that each of the projecting means groups scans the patterned beams across the areas of the substrate as the substrate and the projection systems are displaced relative to each other, the respective areas scanned by the patterned beams from the projecting means groups that are adjacent to each other in the scanning direction are contiguous. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
-
-
12. An apparatus comprising:
-
an array of individually controllable elements that pattern a plurality of beams of radiation; a plurality of projection systems that project respective ones of the patterned beams onto a substrate, each including an array of lenses arranged so that each lens directs a part of the respective patterned beams towards a respective target area on the substrate; and a displacement system that causes relative displacement between the substrate and the projection systems, such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction, wherein the projection systems are arranged in groups, such that lenses in the array of lenses of different groups direct parts of different ones of the patterned beams to different one of the respective target areas of the substrate that are aligned in the scanning direction, wherein the groups are spaced apart in the scanning direction, such that each group scans the respective ones of the patterned beams across a respective area of the substrate as the substrate and the projection systems are displaced relative to each other, and wherein the respective areas being scanned by the respective ones that are adjacent to each other in the scanning direction are contiguous.
-
Specification