Lithographic apparatus and device manufacturing method

• US 7,218,380 B2
• Filed: 06/12/2006
• Issued: 05/15/2007
• Est. Priority Date: 11/22/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: De Jager, Pieter Willem Herman
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/450,384
• Publication Number:
  US 20060232758A1
• Time in Patent Office: 337 Days
• Field of Search: 355/53, 355/55, 355 67- 71, 430/5, 430/20, 430/311, 356399-401, 359619-626
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Abstract

Provided is an apparatus including an array of individually controllable elements and a plurality of projection systems that project respective ones of patterned beams onto a substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction. The projection systems are arranged in groups, such that lenses in the array of lenses of different groups direct parts of different ones of the patterned beams to different ones of the respective target areas of the substrate that are aligned in the scanning direction. The groups are spaced apart in the scanning direction, wherein each group scans the respective ones of the patterned beams across a respective area of the substrate.

Claims

1. A system for manufacturing a device, comprising:

means for patterning each of a plurality of beams using arrays of individually controllable elements;

means for projecting the patterned beams onto a substrate; and

means for displacing the substrate relative to the patterned beams, such that the patterned beams are scanned across the substrate in a predetermined scanning direction; and

means for directing the patterned beams towards the substrate using an array of lenses arranged such that each lens directs a respective part of a respective patterned beam towards a respective target area on the substrate,

means for arranging the projecting means in groups, such that each of the lenses in the arrays of lenses of different ones of the projecting means groups direct parts of different ones of the patterned beams to different areas of the substrate that are aligned in the scanning direction; and

means for spacing the projecting means groups apart in the scanning direction, such that each of the projecting means groups scans the patterned beams across the areas of the substrate as the substrate and the projection systems are displaced relative to each other, the respective areas scanned by the patterned beams from the projecting means groups that are adjacent to each other in the scanning direction are contiguous.

2. The system of claim 1, further comprising means for making the contiguous areas substantially rectangular.

3. The system of claim 2, further comprising:

means for distributing N of the projecting means groups in the scanning direction with a pitch of L/N, where L is a length of the substrate.

4. The system of claim 1, further comprising:

means for spacing two of the projecting means groups apart in the scanning direction with a pitch of half of a length of the substrate; and

means for displacing the substrate relative to the projecting means groups, such that one half of the substrate is displaced across a full width of one of the projecting means groups and the other half of the substrate is displaced across the full width of the other the projecting means groups.

5. The system of claim 4, further comprising:

means for using two arrays of projecting means in each of the groups, the two arrays of projecting means of each the groups exposing a respective half of the substrate and each of the two arrays of the projecting means exposing alternate pixel areas in the scanning direction of the respective part of the substrate.

6. The system of claim 1, further comprising:

means for spacing three of the groups of the projecting means apart in the scanning direction with a pitch of one third of a length of the substrate; and

means for displacing the substrate relative to the groups, such that a respective one third of the substrate is displaced across a full width of each group.

7. The system of claim 1, wherein:

each of the contiguous areas has a generally rectangular main portion and at least one end portion extending in the scanning direction from the main portion, the at least one end portion of each of the contiguous areas having a saw-toothed shape with teeth of one of the at least one end portion overlapping teeth of the contiguous areas.

8. The system of claim 7, wherein each of the at least one end portion has a length in the scanning direction equal to a length in the scanning direction of each of the groups of the projecting means.

9. The system of claim 8, further comprising:

means for distributing N of the groups of the projecting means in the scanning direction with a pitch of (L

     1)/N, where in L is a length of the substrate and 1 is the length in the scanning direction of each of the groups of the projecting means.

10. The system of claim 1, further comprising:

means for displacing the substrate; and

means for making the projecting means stationary.

11. The system of claim 1, further comprising:

means for projecting spots of the patterned beams using each of the arrays of lenses to expose respective ones of the contiguous tracks on the surface of the substrate.

12. An apparatus comprising:

an array of individually controllable elements that pattern a plurality of beams of radiation;

a plurality of projection systems that project respective ones of the patterned beams onto a substrate, each including an array of lenses arranged so that each lens directs a part of the respective patterned beams towards a respective target area on the substrate; and

a displacement system that causes relative displacement between the substrate and the projection systems, such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction,

wherein the projection systems are arranged in groups, such that lenses in the array of lenses of different groups direct parts of different ones of the patterned beams to different one of the respective target areas of the substrate that are aligned in the scanning direction,

wherein the groups are spaced apart in the scanning direction, such that each group scans the respective ones of the patterned beams across a respective area of the substrate as the substrate and the projection systems are displaced relative to each other, and

wherein the respective areas being scanned by the respective ones that are adjacent to each other in the scanning direction are contiguous.