Holding system, exposure apparatus, and device manufacturing method

• US 7,218,383 B2
• Filed: 11/02/2006
• Issued: 05/15/2007
• Est. Priority Date: 11/18/2003
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Matsui, Shin
• Primary Examiner(s): RUTLEDGE, DELLA J
• Application Number:
  US11/555,711
• Publication Number:
  US 20070061609A1
• Time in Patent Office: 194 Days
• Field of Search: 355/72, 355/75
• US Class Current: 355/72
• CPC Class Codes: G03B 27/58 Baseboards, masking frames, or other holders for the sensitive material G03B27/53 takes precedence ; for electrophotographic copiers G03G15/65
• CPC Class Codes: G03F 7/70708 being electrostatic; Electrostatically deformable vacuum chucks
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Abstract

A holding system, provided on a movable stage, for holding an object from above, against gravity. The holding system includes at least one holding portion adapted to be in contact with the object, to hold the object from above, and at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto.

Claims

1. A holding system, provided on a movable stage, for holding an object from above, against gravity, said holding system comprising:

at least one holding portion adapted to be in contact with the object, to hold the object from above; and

at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto.

2. A holding system according to claim 1, wherein said holding portion is adapted to hold the object on the basis of one of electrostatic force, vacuum attraction, electromagnetic force and mechanical holding.

3. A holding system according to claim 1, wherein said attracting portion attracts the limited portion of the object on the basis of electrostatic force.

4. A holding system according to claim 1, wherein said holding system includes three of said holding portions.

5. A holding system according to claim 1, wherein at least one of said holding portion and said attracting portion includes a flowpassage along which a temperature adjusted medium can pass.

6. A holding system according to claim 1, further comprising a mirror, wherein said holding system holds the mirror.

7. A holding system according to claim 1, wherein object is a reflection type original and wherein said holding system holds the reflection type original.

8. A holding system according to claim 7, wherein the holding portion holds a bottom surface portion of the reflection type original, while avoiding a region thereon corresponding to a pattern region.

9. A holding system according to claim 7, further comprising a base plate for holding at least one of the holding portion and the attracting portion, said base plate being held by an original stage.

10. A holding system according to claim 9, wherein said base plate includes a flowpassage along which a temperature adjusted medium can pass.

11. A holding system according to claim 1, wherein said holding system holds the substrate.

12. A holding system according to claim 1, further comprising a surface measuring unit for measuring a shape of a bottom surface of the object held by said holding system, wherein the attraction force of said attracting portion is controlled in accordance with the measurement made by said surface measuring unit.

13. A holding system according to claim 7, wherein at least one of said holding portion and said attracting portion includes a flowpassage along which a temperature adjusted medium can pass.