Electrophotographic photosensitive member and electrophotographic apparatus using the electrophotographic photosensitive member
First Claim
1. An electrophotographic photosensitive member comprising a substrate, a photoconductive layer formed on the substrate and a surface layer formed on the photoconductive layer using silicon and nitrogen atoms as the base material and constituted of non-single-crystal material at least containing oxygen atoms, characterized in thatthe surface layer contains nitrogen atoms as an average concentration shown by the following expression (1) and contains oxygen atoms by the maximum value Omax of the number of oxygen atoms in the thickness direction:
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0.3≦
N/(Si+N)≦
0.7
(1)wherein N denotes the number of nitrogen atoms and Si denotes the number of silicon atoms; and
the surface layer contains oxygen atoms by the minimum value Omin of the number of oxygen atoms in the thickness direction and the minimum value Omin satisfies the relation shown by the following expression (2);
2≦
Omax/Omin
(2).
1 Assignment
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Accused Products
Abstract
To provide a high-image-quality electrophotographic photosensitive member having a high sensitivity for a wavelength close to 380 to 500 nm, remarkable image resolution property in which absorption of the wavelength is hardly recognized, working-environment characteristic and high safety and superior in abrasion resistance and fabrication easiness and reducing optical memories and an electrophotographic apparatus using the high-image-quality electrophotographic photosensitive member. In the case of an electrophotographic photosensitive member having a substrate, photoconductive layer formed on the substrate and surface layer formed on the photoconductive layer and using silicon and nitrogen atoms as base material and containing an amorphous material containing at least oxygen atoms, the surface layer contains nitrogen atoms as an average concentration shown by the following expression (1) and contains oxygen atoms by the maximum value Omax of the number of oxygen atoms in the thickness direction:
0.3≦N/(Si+N)≦0.7. (1)
10 Citations
18 Claims
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1. An electrophotographic photosensitive member comprising a substrate, a photoconductive layer formed on the substrate and a surface layer formed on the photoconductive layer using silicon and nitrogen atoms as the base material and constituted of non-single-crystal material at least containing oxygen atoms, characterized in that
the surface layer contains nitrogen atoms as an average concentration shown by the following expression (1) and contains oxygen atoms by the maximum value Omax of the number of oxygen atoms in the thickness direction: -
0.3≦
N/(Si+N)≦
0.7
(1)wherein N denotes the number of nitrogen atoms and Si denotes the number of silicon atoms; and the surface layer contains oxygen atoms by the minimum value Omin of the number of oxygen atoms in the thickness direction and the minimum value Omin satisfies the relation shown by the following expression (2);
2≦
Omax/Omin
(2). - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. An electrophotographic photosensitive member comprising:
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a substrate; a photoconductive layer formed on the substrate; and a surface layer constituted of a non-single-crystal material formed on the photoconductive layer using silicon and nitrogen atoms as the base material and containing at least fluorine;
characterized in thatthe surface layer contains nitrogen atoms as an average concentration shown by the following expression (4) and fluorine atoms by the maximum value Fmax of the number of fluorine atoms in the thickness direction;
0.3≦
N/(Si+N)≦
0.7
(4)wherein N denotes the number of nitrogen atoms and Si denotes the number of silicon atoms; and the surface layer contains fluorine atoms by the minimum value Fmin of the number of fluorine atoms in the thickness direction and has the relation shown by the following expression (5);
2≦
Fmax/Fmin
(5). - View Dependent Claims (9, 10, 11, 12, 13)
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14. An electrophotographic photosensitive member comprising:
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a substrate; a photoconductive layer formed on the substrate; and a surface layer formed on the photoconductive layer and constituted of a non-single-crystal material using silicon and nitrogen atoms as base material and containing at least oxygen atoms and fluorine atoms, characterized in that the surface layer contains nitrogen atoms as an average concentration shown by the following expression (7), contains oxygen atoms by the maximum value Omax of the number of oxygen atoms in the thickness direction and contains fluorine atoms by the maximum value Fmax of the number of fluorine atoms;
0.3≦
N/(Si+N)≦
0.7
(7)
wherein N denotes the number of nitrogen atoms and Si denotes the number of silicon atoms; andthe surface layer contains oxygen atoms by the minimum value Omin of the number of oxygen atoms in the thickness direction and contains fluorine atoms by the minimum value Fmin of the number of fluorine atoms and minimum values Omin and Fmin respectively satisfy the relations shown by the following expressions (8) and (9);
2≦
Omax/Omin
(8)
2≦
Fmax/Fmin
(9). - View Dependent Claims (15, 16, 17, 18)
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Specification
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- Resources
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Current AssigneeCanon Kabushiki Kaisha (Canon Inc.)
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Original AssigneeCanon Kabushiki Kaisha (Canon Inc.)
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InventorsOwaki, Hironori, Aoki, Makoto, Kojima, Satoshi, Hosoi, Kazuto, Ohira, Jun
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Primary Examiner(s)RODEE, CHRISTOPHER D
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Application NumberUS11/406,416Publication NumberTime in Patent Office419 DaysField of Search430/66, 430/67, 399/159US Class Current430/66CPC Class CodesG03G 5/08221 comprising one or two silic...G03G 5/08235 comprising three or four si...
