Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
First Claim
1. A lithographic apparatus, comprising:
- an illumination system that supplies a beam of radiation;
an array of individually controllable elements that pattern the beam;
a projection system that projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots;
a substrate table for supporting a substrate, such that a target surface of the substrate is substantially coincident with the target plane; and
a sensor system comprising an array of detector elements arranged to receive at least one of the spots and a sensor scanning system arranged to move the array of detector elements from a first sampling position to at least a second sampling position, the sensor system measuring energy of the at least one spot and providing an output signal indicative of the energy of the at least one received spot.
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Accused Products
Abstract
A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.
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Citations
20 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a beam of radiation; an array of individually controllable elements that pattern the beam; a projection system that projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots; a substrate table for supporting a substrate, such that a target surface of the substrate is substantially coincident with the target plane; and a sensor system comprising an array of detector elements arranged to receive at least one of the spots and a sensor scanning system arranged to move the array of detector elements from a first sampling position to at least a second sampling position, the sensor system measuring energy of the at least one spot and providing an output signal indicative of the energy of the at least one received spot. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A device manufacturing method, comprising:
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using an array of individually controllable elements to pattern a beam of radiation; projecting the patterned beam onto a target portion of a substrate, the projected pattern comprising an array of radiation spots; receiving at least one of the spots using an array of detector elements; measuring the energy of the at least one spot; and effecting relative movement between the projected pattern and the array of detector elements, such that the sensor system provides a plurality of indications of the energy of the at least one received spot. - View Dependent Claims (18, 19, 20)
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Specification