Flip chip type nitride semiconductor light emitting device and manufacturing method thereof
First Claim
1. A flip chip type nitride semiconductor light emitting device comprising:
- a) a substrate for growing a nitride semiconductor material;
b) an n-type nitride semiconductor layer formed on the substrate;
c) an active layer formed on at least a part of the n-type nitride semiconductor layer;
d) a p-type nitride semiconductor layer formed on the active layer;
e) a bonding force providing layer formed directly on the p-type nitride semiconductor layer and configured to provide a bonding force relative to the p-type nitride semiconductor layer;
f) a reflective electrode layer formed on the bonding force providing layer, and configured to reflect light produced in the active layer toward the substrate and to diffuse electric current; and
g) a cap layer formed on the reflective electrode layer, and configured to provide a bonding force between the reflective electrode layer and a bonding metal and to reduce contact resistance;
wherein the bonding force providing layer is made of one metal or alloys of two or more metals selected from the group consisting of Ni, Co, Pd, Ir, Rh, Ru, Zn, Mg and Sn;
wherein the reflective electrode layer is made of one metal or alloys of two or more metals selected from the group consisting of Ag, Rh and Al; and
wherein the cap layer is made of one metal selected from the group consisting of Pt and Pd.
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Accused Products
Abstract
Disclosed herein are a flip chip type nitride semiconductor light emitting device, which comprises a substrate for growing a nitride semiconductor material, an n-type nitride semiconductor layer formed on the substrate, an active layer formed on at least a part of the n-type nitride semiconductor layer, a p-type nitride semiconductor layer formed on the active layer, a bonding force providing layer formed on the p-type nitride semiconductor layer and adapted to provide a bonding force relative to the p-type nitride semiconductor layer, a reflective electrode layer formed on the bonding force providing layer, and adapted to reflect light produced in the active layer toward the substrate and to diffuse electric current, and a cap layer formed on the reflective electrode layer, and adapted to provide a bonding force between the reflective electrode layer and a bonding metal and to reduce contact resistance.
25 Citations
9 Claims
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1. A flip chip type nitride semiconductor light emitting device comprising:
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a) a substrate for growing a nitride semiconductor material; b) an n-type nitride semiconductor layer formed on the substrate; c) an active layer formed on at least a part of the n-type nitride semiconductor layer; d) a p-type nitride semiconductor layer formed on the active layer; e) a bonding force providing layer formed directly on the p-type nitride semiconductor layer and configured to provide a bonding force relative to the p-type nitride semiconductor layer; f) a reflective electrode layer formed on the bonding force providing layer, and configured to reflect light produced in the active layer toward the substrate and to diffuse electric current; and g) a cap layer formed on the reflective electrode layer, and configured to provide a bonding force between the reflective electrode layer and a bonding metal and to reduce contact resistance; wherein the bonding force providing layer is made of one metal or alloys of two or more metals selected from the group consisting of Ni, Co, Pd, Ir, Rh, Ru, Zn, Mg and Sn; wherein the reflective electrode layer is made of one metal or alloys of two or more metals selected from the group consisting of Ag, Rh and Al; and wherein the cap layer is made of one metal selected from the group consisting of Pt and Pd. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification