Calibration method for a lithographic apparatus and device manufacturing method
First Claim
1. A calibration method used in a lithographic apparatus, comprising:
- (a) generating a pattern with an array of individually controllable elements;
(b) illuminating the array of individually controllable elements with radiation to generate an image of the pattern onto a substrate table having a radiation sensor;
(c) moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the radiation sensor;
(d) detecting radiation intensity with the radiation sensor;
(e) calculating a calibration value that establishes a relationship between coordinates of a coordinate system of the array of individually controllable elements and coordinates of a coordinate system of the substrate table, based on the detected radiation intensity and positions of the array of individually controllable elements and the substrate table; and
(f) calibrating the array of individually controllable elements using the calibration value.
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Accused Products
Abstract
A calibration method comprising generating a pattern with an array of individually controllable elements, providing a substrate table with a radiation sensor, using radiation to generate an image of the pattern at the substrate table, moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the sensor, detecting radiation intensity with the sensor, and calculating a calibration establishing a relationship between coordinates of the coordinate system of the array of individually controllable elements and coordinates of the coordinate system of the substrate table, based on the detected intensity and the positions of the array of individually controllable elements and the substrate table.
24 Citations
19 Claims
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1. A calibration method used in a lithographic apparatus, comprising:
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(a) generating a pattern with an array of individually controllable elements; (b) illuminating the array of individually controllable elements with radiation to generate an image of the pattern onto a substrate table having a radiation sensor; (c) moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the radiation sensor; (d) detecting radiation intensity with the radiation sensor; (e) calculating a calibration value that establishes a relationship between coordinates of a coordinate system of the array of individually controllable elements and coordinates of a coordinate system of the substrate table, based on the detected radiation intensity and positions of the array of individually controllable elements and the substrate table; and (f) calibrating the array of individually controllable elements using the calibration value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A device manufacturing method, comprising:
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using an array of individually controllable elements to pattern a first beam of radiation; projecting the patterned first beam of radiation onto a target portion of a substrate, generating a pattern with the array of individually controllable elements; illuminating the array of individually controllable elements with a second beam of radiation to generate an image of the pattern onto a substrate table having a radiation sensor; moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the radiation sensor; detecting radiation intensity with the radiation sensor; calculating a calibration value establishing a relationship between coordinates of a coordinate system of the array of individually controllable elements and coordinates of a coordinate system of the substrate table, based on the detected radiation intensity and positions of the array of individually controllable elements and the substrate table; and positioning the substrate and the array of individually controllable elements with respect to each other using the calibration information. - View Dependent Claims (18)
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19. A computer program product for controlling a lithographic apparatus comprising a computer useable medium having a computer program logic recorded thereon for controlling at least one processor, the computer program logic comprising:
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computer program code means for generating a pattern with an array of individually controllable elements; computer program code means for illuminating the array of individually controllable elements with radiation to generate an image of the pattern onto a substrate table having a radiation sensor; computer program code means for moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the radiation sensor; computer program code means for detecting radiation intensity with the radiation sensor; computer program code means for calculating a calibration value establishing a relationship between coordinates of a coordinate system of the array of individually controllable elements and coordinates of a coordinate system of the substrate table, based on the detected radiation intensity and positions of the array of individually controllable elements and the substrate table; and computer program code means for calibrating the array of individually controllable elements using the calibration value.
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Specification