System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold

• US 7,240,679 B2
• Filed: 12/24/2002
• Issued: 07/10/2007
• Est. Priority Date: 09/30/2002
• Status: Expired due to Fees

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Woods, Carl, de Larios, John
• Primary Examiner(s): Perrin; Joseph L.
• Application Number:
  US10/330,897
• Publication Number:
  US 20040060573A1
• Time in Patent Office: 1,659 Days
• Field of Search: 134/95.1, 134/95.2, 134/95.3, 134/99.1, 134/166.R, 134/167.R, 134/198, 134/902, 344/07
• US Class Current: 134/95.2
• CPC Class Codes: C25D 17/001 Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
• CPC Class Codes: C25D 5/34 Pretreatment of metallic surfaces to be electroplated
• CPC Class Codes: H01L 21/02041 Cleaning
• CPC Class Codes: H01L 21/02052 Wet cleaning only H01L21/02085 takes precedence
• CPC Class Codes: H01L 21/67028 for cleaning followed by drying, rinsing, stripping, blasting or the like
• CPC Class Codes: H01L 21/67034 for drying
• CPC Class Codes: H01L 21/67046 using mainly scrubbing means, e.g. brushes
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles
• CPC Class Codes: Y10S 134/902 Semiconductor wafer

Abstract

One of many embodiments of a substrate preparation system is provided which includes a drying system, the drying system including at least one proximity head for drying a substrate. The system also includes a cleaning system for cleaning the substrate.

Claims

1. A substrate preparation system, comprising:

a drying system, the drying system including a proximity head for drying a substrate, the drying system includes,

the proximity head having a plurality of conduits for delivering a fluid to a surface of the substrate and a plurality of conduits for removing the fluid from the surface of the substrate, such that a fluid meniscus is capable of being defined and contained between a surface of the proximity head and the surface of the substrate, the surface of the proximity head having flat surface regions, wherein the plurality of conduits for delivering the fluid to the surface of the substrate and the plurality of conduits for removing the fluid from the surface of the substrate extend through the flat surface regions of the surface of the proximity head;

facilities connections for providing facilities to the proximity head, the facilities providing the fluid; and

an arm connected to the proximity head, the arm being configured so the proximity head is positioned in non-contact close proximity to the surface of the substrate, the substrate configured to be dried when the meniscus enabled by the facilities scans the surface of the substrate to ensure drying of the substrate.

2. A substrate preparation system as recited in claim 1, wherein the proximity head is a first proximity head, and the first proximity head being disposed on one side of the substrate;

a second proximity head being disposed on an opposite side of the substrate; and

a second arm connected to the second proximity head, the second arm being configured so the second proximity head is placed in non-contact close proximity to the opposite side of the substrate.

3. A substrate preparation system as recited in claim 1, further comprising a cleaning system, and the cleaning system is one of a brush box or a megasonic system.

4. A cluster architecture system for processing a substrate, comprising:

an integrated drying system, the integrated drying system including at least one proximity head for drying a substrate, the integrated drying system includes,

a proximity head carrier assembly, the proximity head carrier assembly having

a proximity head, the proximity head having a plurality of conduits for delivering a fluid to a surface of the substrate and a plurality of conduits for removing the fluid from the surface of the substrate, such that a fluid meniscus is capable of being defined and contained between a surface of the proximity head and the surface of the substrate, the surface of the proximity head having flat surface regions, wherein the plurality of conduits for delivering the fluid to the surface of the substrate and the plurality of conduits for removing the fluid from the surface of the substrate extend through the flat surface regions of the surface of the proximity head;

processing modules coupled to the integrated drying system, the processing modules selected from one or more of a chemical mechanical planarization module, a megasonic processing module, a cleaning module, a deposition module, and an etching module;

facilities for providing one or more of (i) power, (ii) processing chemicals, (iii) fluids, (iv) processing gasses, (v) drainage, (vi) vacuum, (vii) exhaust, and (viii) air; and

computer control system being integrated with the cluster architecture system.

5. A cluster architecture system for processing a substrate as recited in claim 4, wherein the cleaning module is one of a brush box and a spin rinse and dry (SRD) module.

6. A cluster architecture system for processing a substrate as recited in claim 4, wherein the integrated drying system includes,

an arm connected to the proximity head, the arm being configured so the proximity head is positioned in non-contact close proximity to the surface of the substrate, the substrate configured to be dried when the meniscus enabled by the facilities scans the surface of the substrate to ensure drying of the substrate.

7. A cluster architecture system for processing a substrate as recited in claim 4, wherein the proximity head is a first proximity head, and the first proximity head is configured to be disposed on one side of the substrate;

a second proximity head being disposed on an opposite side of the substrate; and

a second arm connected to the second proximity head, the second arm being configured so the second proximity head is placed in non-contact close proximity to the opposite side of the substrate.