System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions

• US 7,242,456 B2
• Filed: 05/26/2004
• Issued: 07/10/2007
• Est. Priority Date: 05/26/2004
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Vladimirsky, Yuli, Ryzhikov, Lev, Sakin, Lev
• Primary Examiner(s): Kim; Peter B.
• Application Number:
  US10/853,558
• Publication Number:
  US 20050264782A1
• Time in Patent Office: 1,140 Days
• Field of Search: 355/55, 355/53, 355/67, 250/548, 250/492.2, 345/694, 347/256, 359/290, 359/291, 359/298, 430/22
• US Class Current: 355/55
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.

Claims

1. A system, comprising:

a first module including a set of pattern generating devices;

a second module including a set of magnification changing devices having different magnifications, each of the magnification changing devices being aligned with a corresponding one of the pattern generating devices based on a correlation between a characteristic of the pattern generating devices and the magnification of the magnification changing devices;

a third module including a set of illuminating devices;

a fourth module including a set of projection optical devices; and

a substrate that receives exposure light beams from the fourth module,

wherein the set of illuminating devices in the third module is configured to direct illumination through the set of magnification changing devices in the second module to reflect the illumination from the set of pattern generating devices in the first module, and

wherein the reflected light passes back through the set of magnification changing devices in the second module and is directed by the set of illuminating devices in the third module onto the set of projection optical devices in the fourth module.

2. The system of claim 1, wherein at least one of the sets comprises more than one of the respective devices.

3. The system of claim 1, wherein at least two of the modules have a same number of respective devices.

4. The system of claim 1, wherein the set of pattern generating devices comprises at least one of reticles, spatial light modulators, contrast devices, grating light valves, digital mirror devices, and liquid crystal display devices.

5. The system of claim 1, wherein the set of magnification changing devices comprises one or more optical devices.

6. The system of claim 5, wherein the one or more optical devices comprise lenses.

7. The system of claim 1, wherein light beams travel through a plurality of light channels in respective ones of the sets of devices.

8. The system of claim 1, wherein the characteristics of the set of pattern generating devices correspond to a desired resolution of a pattern generated by the set of pattern generating devices.

9. The system of claim 1, wherein the first and second modules are combined into a single module.

10. The system of claim 1, wherein the set of illumination devices comprises:

at least one illumination optical system; and

at least one beam splitter.

11. The system of claim 1, wherein an entire surface of the substrate receives the exposure light beams substantially simultaneously.

12. The system of claim 1, further comprising:

a detector that detects the individual characteristics of each of the pattern generating devices in the first module and that produces respective result signals therefrom; and

a controller that uses the respective result signals to control which of the magnification changing devices in the second module is aligned with which of the pattern generating devices in the first module based on the respective magnification of the magnification changing device.

13. The system of claim 12, wherein the controller is configured to rotate respective ones of the magnification changing devices to align them with corresponding ones of the pattern generating devices.

14. The system of claim 1, wherein the third module receives a beam of radiation from a radiation source.

15. The system of claim 1, wherein the third module receives a beam of radiation from a plurality of radiation sources.

16. The system of claim 1, wherein the third module receives a plurality of beams of radiation from a first end of a light divider that receives radiation from a radiation source at a second end of the light divider.

17. The system of claim 16, wherein the light divider comprises a single-in-multiple-out waveguide.

18. The system of claim 16, wherein the divider comprises a set of optical elements.

19. A system, comprising:

a set of pattern generators;

a set of magnification changing devices having a same number of magnification changing devices as pattern generators in the set of pattern generators and having different magnifications; and

a controller that is configured to determine a characteristic of each of the pattern generators and move a correlating one of the magnification changing devices to align with a corresponding one of the pattern generators based on the characteristic of the corresponding one of the pattern generators;

an illumination system;

an optical system; and

a projection system,

whereby radiation generated by the illumination system is directed by the optical system through respective ones of the magnification changing devices onto corresponding ones of the set of pattern generators to form patterned light beams, and

whereby the patterned light beams are directed by the optical system onto the projection system to be projected by the projection system onto a substrate.

20. The system of claim 19, wherein the set of pattern generators comprises one of static pattern generators and dynamic pattern generators.

21. The system of claim 20, wherein the static pattern generators comprise one of reticles, masks, and photomasks.

22. The system of claim 20, wherein the dynamic pattern generators comprise one of digital mirror devices, liquid crystal displays, and grating light valves.

23. The system of claim 19, wherein the magnification changing devices comprise one or more optical devices.

24. The system of claim 23, wherein the one or more optical devices comprises lenses.

25. A method, comprising:

(a) determining a characteristic of each patterning device in a plurality of patterning devices;

(b) aligning a corresponding magnification changing device in a plurality of magnification changing devices, having different magnifications, with a respective one of the patterning devices in the plurality of patterning devices based on step (a);

(c) directing light through the plurality of magnification changing devices onto respective ones of the plurality of patterning devices to pattern the light; and

(d) projecting the patterned light onto a substrate.