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Lithographic apparatus and device manufacturing method utilizing a multiple substrate carrier for flat panel display substrates

  • US 7,242,458 B2
  • Filed: 03/01/2005
  • Issued: 07/10/2007
  • Est. Priority Date: 12/23/2004
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus, comprising:

  • an illumination system, wherein the illumination system is arranged to generate a beam of radiation;

    a patterning system, wherein the patterning system is arranged to pattern the beam;

    a substrate table, wherein the substrate table is arranged to simultaneously hold a plurality of substrates;

    a projection system, wherein the projection system is arranged to project the patterned beam onto a target portion of a corresponding one of the plurality of substrates;

    a substrate handler, wherein the substrate handler is arranged to move each of the plurality of substrates relative to the substrate table and is arranged to singly or simultaneously carry the plurality of substrates; and

    separation devices associated with the substrate table, wherein the separation devices are moveable to form various sized sections to at least one of hold or position various sized ones of the plurality of substrates.

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