Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus, comprising:
- a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate; and
an actuator configured to drive an object in six degrees of freedom, wherein the actuator comprises a five degrees of freedom small stroke Lorentz actuator and a one or two degree of freedom 2-phase or 3-phase motor.
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Abstract
A lithographic projection apparatus includes a conduit shuttle used to at least partly support conduits which provide utilities to moveable objects. The conduit shuttle has an actuator which is positionable with six degrees of freedom. The actuator comprises a 2-phase or 3-phase motor with one degree of freedom and a Lorentz actuator with five degrees of freedom.
23 Citations
21 Claims
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1. A lithographic projection apparatus, comprising:
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a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and an actuator configured to drive an object in six degrees of freedom, wherein the actuator comprises a five degrees of freedom small stroke Lorentz actuator and a one or two degree of freedom 2-phase or 3-phase motor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A lithographic projection apparatus, comprising:
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a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and an actuator configured to drive the support in six degrees of freedom, wherein the actuator comprises; a one or two degree of freedom 2-phase or 3-phase motor used at least to move the support in a primarily long stroke scanning motion during projection of the patterned beam, and a five degrees of freedom small stroke Lorentz actuator. - View Dependent Claims (18, 19, 20)
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21. A lithographic projection apparatus, comprising:
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a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and an actuator configured to drive the support or the substrate table in six degrees of freedom, wherein the actuator comprises a five degrees of freedom Lorentz actuator and a 2-phase or 3-phase motor.
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Specification