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Lithographic apparatus and method for optimizing illumination using a photolithographic simulation

  • US 7,245,356 B2
  • Filed: 11/17/2005
  • Issued: 07/17/2007
  • Est. Priority Date: 02/11/2003
  • Status: Expired due to Term
First Claim
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1. A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus, the method comprising:

  • determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification;

    calculating a metric that represents a variation of a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, anddepending on a result of the metric, iteratively (a) varying the initial patterning device and illumination arrangement parameters and (b) calculating the metric until a substantially maximum or minimum value of the lithographic response is obtained.

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