High Q inductor integration
First Claim
Patent Images
1. A method of forming a via between metal layers in an integrated circuit, comprisingforming a via post by depositing a metal layer, performing a photoresist and masking step, and etching away the metal to leave the via post, andthereafter depositing a main dielectric through which the via post extends.
1 Assignment
0 Petitions
Accused Products
Abstract
In an inductor integration process, a high Q inductor is achieved by forming an AlCu inductor via prior to depositing the inductor dielectric.
22 Citations
12 Claims
-
1. A method of forming a via between metal layers in an integrated circuit, comprising
forming a via post by depositing a metal layer, performing a photoresist and masking step, and etching away the metal to leave the via post, and thereafter depositing a main dielectric through which the via post extends.
Specification