Lithographic apparatus and device manufacturing method

• US 7,248,339 B2
• Filed: 07/01/2004
• Issued: 07/24/2007
• Est. Priority Date: 07/04/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Loopstra, Erik Roelof, Peeters, Felix Godfried Peter, Van Schothorst, Gerard, Van Eijk, Jan, Munnig Schmidt, Robert-Han
• Primary Examiner(s): RUTLEDGE, DELLA J
• Application Number:
  US10/880,606
• Publication Number:
  US 20050041233A1
• Time in Patent Office: 1,118 Days
• Field of Search: 355/72, 355/75
• US Class Current: 355/72
• CPC Class Codes: F16F 7/1005 characterised by active control of the mass
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.

Claims

1. A lithographic apparatus, comprising:

a substrate holder configured to hold a substrate;

a radiation system configured to condition a beam of radiation;

a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation;

a projection system that projects the patterned beam onto a target portion of the substrate;

a base frame;

at least one actuator that moves the substrate holder relative to the base frame; and

a balance mass, supported by the base frame, arranged such that the substrate holder exerts a reaction force on the balance mass,

wherein the balance mass is resiliently connected to the base frame with a suspension frequency that is different than resonant frequency of the base frame.

2. The lithographic apparatus of claim 1, wherein the balance mass comprises a sub-frame supported by the base frame and on which the substrate holder is placed.

3. The lithographic apparatus of claim 1, further comprising a resilient mechanism and/or a damper connected between the base frame and the balance mass.

4. A lithographic apparatus, comprising:

a substrate holder configured to hold a substrate;

a radiation system configured to condition a beam of radiation;

a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation;

a projection system that projects the patterned beam onto a target portion of the substrate;

a base frame;

at least one actuator configured to apply a force to the base frame;

a balance mass supported by the base frame and coupled to the base frame via the at least one actuator; and

a controller configured to control the at least one actuator,

wherein when one or more moving components within the apparatus applies a reaction force to the base frame, the controller controls the actuator to apply a force, which is opposite in magnitude and direction to the reaction force, to the base frame.

5. The apparatus of claim 4, wherein the at least one actuator is connected between the base frame and a floor on which the base frame rests, and the controller controls the at least one actuator using feedforward control with an input of known movements within the lithographic apparatus, which exert a reaction force on the base frame.

6. The apparatus of claim 5, wherein the support structure comprises a mask holder that holds a mask, and wherein the known movements within the apparatus are movements of the substrate holder and/or the mask holder.

7. The apparatus of claim 4, wherein the at least one actuator comprises a piezo-electric actuator.

8. The apparatus of claim 4, wherein the support structure comprises:

a mask holder that holds a mask; and

a mask frame that supports the mask holder for relative movement thereto, the mask frame being connected to the base frame by the actuator and supported for movement relative to the base frame,

wherein the controller controls the actuator using feedforward control based on the known movements of the mask holder relative to the support structure.

9. The apparatus of claim 4, wherein the controller controls the at least one actuator using feedforward control with an input of known movements within the apparatus, which exert a reaction force on the base frame.

10. The apparatus of claim 4, wherein the controller has an input of known movements within the apparatus, which exert a reaction force on the base frame only in the main scanning direction of the base frame.

11. A device manufacturing method, comprising:

providing a substrate that is at least partially covered by a layer of radiation-sensitive material, the substrate being carried by a substrate holder that is movable, via at least one actuator relative to a base frame;

projecting a patterned beam of radiation onto a target portion of the substrate; and

moving the substrate holder that exerts a reaction force to a balance mass that is supported by and coupled to the base frame;

wherein the balance mass is resiliently coupled to the base frame with a suspension frequency that is different than resonant frequency of the base frame.