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Method for fabricating a structure for a microelectromechanical system (MEMS) device

  • US 7,250,315 B2
  • Filed: 09/14/2004
  • Issued: 07/31/2007
  • Est. Priority Date: 02/12/2002
  • Status: Expired due to Fees
First Claim
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1. A method of fabricating a microelectromechanical system device, comprising:

  • forming a first conductive layer on a substrate;

    depositing at least one first layer on the first conductive layer;

    patterning said first layer to define at least a first portion of said microelectromechanical system device;

    depositing a second layer on said first layer, wherein the second layer comprises a negative-acting photoresist;

    patterning said second layer using said first layer as a photomask;

    developing said second layer to form a plurality of a supports of the microelectromechanical system device; and

    forming a structural layer over the supports.

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