Spatial filtering in interferometry

• US 7,251,041 B2
• Filed: 03/25/2005
• Issued: 07/31/2007
• Est. Priority Date: 03/04/2002
• Status: Expired due to Fees

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Hill, Henry A.
• Primary Examiner(s): Toatley, Jr.; Gregory J.
• Assistant Examiner(s): CONNOLLY, PATRICK J
• Application Number:
  US11/090,657
• Publication Number:
  US 20050168755A1
• Time in Patent Office: 858 Days
• Field of Search: 356/486, 356/487, 356490-493, 356/498, 356/500, 356/508, 356/509
• US Class Current: 356/498
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02007 Two or more frequencies or sources used for interferometric measurement using only beat G01B9/02003
• CPC Class Codes: G01B 9/02018 Multipass interferometers, e.g. double-pass
• CPC Class Codes: G01B 9/02019 contacting different points on same face of object

Abstract

Spatial filtering of beams in interferometry systems is used to reduce a displacement of the beams from an optical path corresponding to the path of the beams in an optimally-aligned system. By reducing beam displacement from the optical path, the system reduces the magnitude of beam shears and associated non-cyclic errors in linear and angular displacements measured by the interferometry systems.

Claims

1. A method, comprising:

directing a first beam and a second beam along respective paths, wherein the first beam contacts a measurement object and wherein the first and second beams are derived from a common source;

passing the first beam through an aperture after it contacts the measurement object; and

combining the first and second beams to form an output beam, wherein the output beam comprises information about an optical path length difference between the first and second beams.

2. The method of claim 1, wherein changes in the orientation of the measurement object cause a displacement of the first beam from a nominal beam path.

3. The method of claim 2, wherein the spatial filtering reduces the displacement of the first beam from the nominal beam path.

4. The method of claim 3, wherein the nominal path corresponds to the first beam path when the measurement object is in a reference oriented.

5. The method of claim 4, wherein the first beam is normally incident on the measurement object when the measurement object is in the reference orientation.

6. The method of claim 2, wherein the displacement of the first beam from the nominal beam path causes a measurable interferometric phase derived from the output beam to deviate from the expression Φ

=pknL, where p is an integer, k is the wavenumber of the output beam, and nL corresponds to the optical path length difference.

7. The method of claim 6, wherein the deviation comprises a non-cyclic error term that varies in a nonperiodic way on the optical path length difference.

8. The method of claim 1, wherein the first and second beams are directed along separate paths by an interferometer.

9. The method of claim 8, wherein the interferometer is a high stability plane mirror interferometer.

10. The method of claim 1, wherein the first beam contacts the measurement object more than once.

11. The method of claim 10, wherein the first beam contacts the measurement object twice.

12. The method of claim 1, wherein the measurement object is a plane mirror.

13. The method of claim 6, further comprising detecting the measurable interference phase and determining information related to the optical path length difference based on the detected phase.

14. The method of claim 13, wherein passing the measurement beam through the aperture reduces deviations of the phase from the expression Φ

=pknL.

15. The method of claim 13, wherein passing the measurement beam through the aperture reduces the contribution of a non-linear non-cyclic error term to the measurable phase.

16. The method of claim 1, wherein the first beam is passed through the aperture prior to being combined with the second beam.

17. The method of claim 1, wherein the first beam is passed through the aperture after being combined with the second beam.

18. An apparatus, comprising:

an interferometer which during operation directs a first beam and a second beam along respective paths and then combines the first and second beams to produce an output beam, wherein the first beam contacts a measurement object and changes in the orientation of the measurement object cause a displacement of the first beam from a nominal beam path, and wherein the output beam comprises information about an optical path length difference between the first and second beams; and

an aperture positioned in the path of the first beam to reduce the displacement of the first beam from the nominal beam path.

19. The apparatus of claim 18, further comprising a detector positioned to detect an intensity of the output beam.

20. The apparatus of claim 19, further comprising an electronic controller coupled to the detector, which during operation monitors an interference phase related to the optical path length difference between the first and second beams.

21. The apparatus of claim 18, wherein the displacement of the first beam from the nominal beam path causes a measurable interferometric phase derived from the output beam to deviate from the expression Φ

=pknL, where p is an integer, k is the wavenumber of the output beam, and nL corresponds to the optical path length difference.

22. The apparatus of claim 21, wherein the deviation comprises a non-cyclic error term that varies in a nonperiodic way on the optical path length difference.

23. The apparatus of claim 18, wherein the interferometer directs the first beam to contact the measurement object more than once.

24. The apparatus of claim 23, wherein the interferometer directs the first beam to contact the measurement object twice.

25. The apparatus of claim 18, wherein the interferometer is a high stability plane mirror interferometer.

26. The apparatus of claim 18, wherein the nominal path corresponds to the path of the first beam when the measurement object is in a reference orientation.

27. The apparatus of claim 26, wherein the first beam is normally incident on the measurement object when the measurement object is in the reference orientation.

28. The apparatus of claim 18, wherein the aperture is positioned in the path of the output beam.

29. The apparatus of claim 18, further comprising a light source which during operation generates an input beam from which the interferometer derives the first and second beams.

30. A method for monitoring the position of a measurement object, comprising:

directing a first beam and a second beam along respective paths, wherein the first beam contacts the measurement object and wherein the first and second beams are derived from a common source;

passing the first beam through an aperture after it contacts the measurement object;

combining the first and second beams to form an output beam;

detecting a phase of the output beam related to an optical path length difference between the first and second beams; and

monitoring the position of the measurement object based on the detected phase.