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Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium

  • US 7,253,077 B2
  • Filed: 12/01/2003
  • Issued: 08/07/2007
  • Est. Priority Date: 12/01/2003
  • Status: Expired due to Fees
First Claim
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1. A method of preparing a substrate, said method comprising:

  • exposing the substrate with a plurality of images, each of the plurality of images having a different orientation with respect to a crystal axis of the substrate; and

    anisotropically etching the substrate to form a plurality of alignment markers, a location of at least a portion of each of the plurality of alignment markers substantially coinciding with a location of a corresponding portion of a corresponding one of the plurality of images,wherein the orientation of each of the plurality of images is within four degrees of the orientation of each other one of the plurality of images.

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