Lithographic apparatus and device manufacturing method

• US 7,256,867 B2
• Filed: 12/22/2004
• Issued: 08/14/2007
• Est. Priority Date: 12/22/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Luttikhuis, Bernardus Antonius Johannes, Van Der Schoot, Harmen Klaas, Vosters, Petrus Matthijs Henricus
• Primary Examiner(s): RUTLEDGE, DELLA J
• Application Number:
  US11/018,928
• Publication Number:
  US 20060132734A1
• Time in Patent Office: 965 Days
• Field of Search: 355/53, 355/72, 355/75
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70616 Monitoring the printed patterns
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70991 Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Abstract

A lithographic method and apparatus comprises an illumination system that supplies a beam of radiation, a patterning device that patterns the beam, and a projection system that projects the patterned beam onto a target portion of a substrate. A metrology system is provided adjacent the projection system for aligning the substrate with the projection system. Two or more movable chucks are each arranged to support a substrate and move between a loading device and the projection system. The chucks are independently movable so that one substrate can be passed through the metrology system and patterned beam while the other substrates are moved between the loading system and projection system.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

a patterning device that patterns the beam;

two or more movable chucks, each arranged to support a corresponding substrate;

a projection system that projects the patterned beam onto a target portion of one of the substrates;

a metrology system adjacent the projection system that aligns the substrate with the projection system as it enters the patterned beam; and

a loading device that places the substrates onto the chucks,

wherein the chucks are independently movable so that one of the substrates is passed through the patterned beam, while another one of the substrates is moved between a loading system and projection system.

2. The apparatus of claim 1, wherein the patterning device comprises an array of individually controllable elements.

3. The apparatus of claim 1, wherein the projection system and the patterning device comprise an array of projection elements.

4. The apparatus of claim 1, wherein the projection system and the metrology system are mounted on a single frame.

5. The apparatus of claim 1, further comprising a preconditioning system for thermally preconditioning one of the substrates while another one of the substrates is passed through the patterned beam.

6. The apparatus of claim 5, wherein the preconditioning system is arranged in the same location as the loading device, so as to precondition one of the substrates when it is mounted on the loading device.

7. The apparatus of claim 5, wherein the preconditioning system is arranged so as to precondition one of the substrates when the substrate is placed on its corresponding chuck.

8. The apparatus of claim 1, wherein the projection system and the metrology system are located in a first carousel lane and the loading device is located in a second carousel lane, so that one of the substrates is passed along the first carousel lane through the patterned beam while, another one of the substrates is loaded onto its corresponding chuck in the second carousel lane.

9. The apparatus of claim 8, further comprising an additional metrology system located in the second carousel lane that performs preparatory measurements on each one of the substrates before the respective substrate is moved to the projection system.

10. The apparatus of claim 8, further comprising:

intra-lane drives that move the chucks along each of the first and second carousel lanes; and

inter-lane drives that move the chucks between the first and second carousel lanes.

11. The apparatus of claim 1, wherein the chucks are arranged to move substantially in a circular pattern.

12. The apparatus of claim 1, wherein all of the chucks follow a same path.

13. The apparatus of claim 1, wherein one of the chucks begins passing through the metrology system while another one of the chucks finishes passing through the patterned beam.

14. The apparatus of claim 1, further comprising a base frame for supporting the projection system, the metrology system, and the chucks.

15. The apparatus of claim 14, wherein each one of the chucks is mounted on a long stroke frame movable about the base frame using a planar drive.

16. The apparatus of claim 15, wherein each one of the chucks is movable on its corresponding one of the long stroke frames via a short stroke actuator.

17. The apparatus of claim 15, wherein the planar drive comprises a coil mounted in the base frame and at least one magnet mounted in each one of the long stroke frames.

18. The apparatus of claim 15, wherein the base frame comprises a magnet plate.

19. The apparatus of claim 14, wherein the base frame is formed from a plurality of subsidiary base frames.

20. The apparatus of claim 1, further comprising an unloading device for removing the substrates from the chucks.

21. The apparatus of claim 20, wherein the loading device and the unloading device are located one above the other.

22. The apparatus of claim 21, wherein the loading device and the unloading device are arranged to move the substrates on and off a respective one of the chucks from a same side.

23. The apparatus of claim 22, further comprising an additional unloading device for receiving one of the substrates from the first or additional unloading device and for unloading the substrate from the apparatus.

24. The apparatus of claim 23, wherein the first loading device and the additional unloading device are located at opposite ends of the apparatus, so that the substrates are loaded into the apparatus at one end of the apparatus and unloaded at the opposite end.

25. The apparatus of claim 24, wherein:

the projection system and the metrology system are located in a first carousel lane; and

the first loading device, the unloading device, and the additional unloading device are located in a second carousel lane.

26. The apparatus of claim 1, wherein the substrates are flat panel display substrates.

27. A carousel for use in a lithographic apparatus that comprises an illumination, patterning, and projection system that patterns a beam of radiation and projects the patterned beam onto a target portion of a substrate and a metrology system adjacent the projection system that ensures the substrate is aligned with the projection system, the carousel comprising:

two or more chucks, each arranged to support a corresponding one of the substrates; and

a loading device that places the substrates onto the chucks;

wherein the chucks are independently movable, so that one of the substrates is passed through the metrology system and the patterned beam, while another one of the substrates is moved between a loading system and the projection system.

28. A device manufacturing method, comprising:

patterning a beam of radiation provided by a illumination system using a patterning device;

providing two or more movable chucks, each arranged to support a corresponding substrate;

aligning a first one of the substrates with a projection system using a metrology system adjacent the projection system;

projecting the patterned beam onto a target portion of a first one of the substrates with the projection system;

placing the substrates onto the chucks using a loading device; and

independently moving a second one of the substrates between the loading device and the projection system, while the patterned beam is projected onto the first substrate.

29. The method of claim 28, wherein the patterning device comprises an array of individually controllable elements.

30. The method of claim 28, wherein the projection system and the patterning device comprise an array of projection elements.

31. The method of claim 28, further comprising aligning the first substrate with the projection system as it passes into the patterned beam.

32. The method of claim 31, further comprising preconditioning the second substrate while it is mounted on the loading device.

33. The method of claim 28, further comprising thermally conditioning the second substrate while the first substrate is passed through the patterned beam.

34. The method of claim 33, further comprising preconditioning the second substrate after it has been placed onto its corresponding chuck.

35. The method of claim 28, further comprising:

locating the projection system and the metrology system in a first carousel lane; and

locating the loading device in a second carousel lane; and

loading the second substrate onto its corresponding chuck while the first substrate is passed along the first carousel lane through the patterned beam.

36. The method of claim 35, further comprising moving the second substrate from the second carousel lane into the first carousel lane while the first substrate passes along the first carousel lane and through the patterned beam.

37. The method of claim 36, further comprising moving the second substrate along the first carousel lane and aligning the second substrate with the projection system as the first substrate moves along the first carousel lane and out of the patterned beam.

38. The method of claim 36, further comprising moving the first substrate rapidly from the first carousel lane to the second carousel lane as soon as it has moved out of the patterned beam.

39. The method of claim 35, further comprising performing preparatory measurements on the second substrate, using an additional metrology system located in the second carousel lane, while the first substrate is passed along the first carousel lane through the patterned beam.

40. The method of claim 35, further comprising:

moving the chucks along the first and second carousel lanes using intra-lane drives; and

moving the chucks between the first and second carousel lanes using inter-lane drives.

41. The method of claim 28, further comprising moving the chucks substantially in a circular pattern.

42. The method of claim 28, wherein all of the chucks follow the same path.

43. The method of claim 28, further comprising supporting the projection system, the metrology system, and the chucks on a base frame.

44. The method of claim 43, further comprising:

mounting each one of the chucks on a long stroke frame; and

moving the long stroke frames about the base frame using a planar drive.

45. The method of claim 44, further comprising moving each one of the chucks on a respective one of the long stroke frames via a short stroke actuator.

46. The method of claim 44, wherein the planar drive comprises a coil mounted in the base frame and at least one magnet mounted in each long stroke frame.

47. The method of claim 44, wherein the base frame comprises a long stroke magnet plate.

48. The method of claim 43, further comprising forming the base frame from a plurality of subsidiary base frames.

49. The method of claim 28, further comprising beginning to pass one of the chucks through the metrology system while another one of the chucks finishes passing through the patterned beam.

50. The method of claim 28, further comprising removing the substrates from a respective one of the chucks using an unloading device.

51. The method of claim 50, further comprising positioning the loading device and unloading device one above the other.

52. The method of claim 51, further comprising moving the substrates on and off respective one of the chucks from a same side using the loading and the unloading devices.

53. The method of claim 52, further comprising passing one of the substrates from the unloading device to an additional unloading device.

54. The method of claim 53, further comprising:

locating the loading device and the additional unloading device at opposite ends of a base frame having mounted thereon the projection system, the metrology system, and the movable chucks;

loading each one of the substrates onto the loading device at one end of the base frame; and

unloading each one of the substrates from the additional unloading device at the opposite end of the base frame.

55. The method of claim 54, further comprising:

positioning the projection system and the metrology system in a first carousel lane; and

positioning the loading device, the unloading device, and the additional unloading device are located in a second carousel lane.

56. The method of claim 28, wherein the substrates are flat panel display substrates.