Process for preparing metal coatings from liquid solutions utilizing cold plasma

• US 7,258,899 B1
• Filed: 12/12/2002
• Issued: 08/21/2007
• Est. Priority Date: 12/13/2001
• Status: Active Grant

• Current Assignee: AMT Holdings, Inc.
• Original Assignee: AMT Holdings, Inc.
• Inventors: Conover, Stephen P., Sharma, Ashok K.
• Primary Examiner(s): PADGETT, MARIANNE L
• Application Number:
  US10/317,359
• Publication Number:
  US 20070184208A1
• Time in Patent Office: 1,713 Days
• Field of Search: 427/535, 427/536, 427/537, 427/539, 427/540, 427/571, 427/576, 427/244, 427/245
• US Class Current: 427/535
• CPC Class Codes: C23C 18/08 characterised by the deposition of metallic material
• CPC Class Codes: C23C 18/145 Radiation by charged particles, e.g. electron beams or ion irradiation

Abstract

A method for depositing metals, metal blends and alloys onto substrate surfaces, including microporous substrates utilizing a plasma operation undertaken at room temperature. In the process, a liquid solution of a monomer or comonomer precursor having a metallic component is utilized to wet the surface of the substrate, with the solvent portion thereafter being removed to leave the substrate surface coated with a dry deposit. The coated substrate is then introduced into a plasma reaction chamber with RF energy being applied across spaced electrodes to create a plasma glow along with the introduction of a plasma supporting gas. The substrate is exposed to the plasma glow for conversion of the precursor to dissociated form to create a deposit consisting essentially of the metallic component in elemental form as a cohesive film on the substrate surface. Preferred metals include such noble metals as platinum, gold and silver, as well as other metals. Preferred precursors include platinum hexafluoro-acetylacetonate, (trimethyl) methylcyclopentadienyl platinum, dimethyl(acetylacetonate) gold, and trimethyl phosphine (hexafluoroacetyl acetonate) silver.

Claims

1. The method of preparing continuous thin metallic films upon porous substrate surfaces which includes the steps of:

(a) selecting a porous substrate having open voids exposed to a surface of said porous substrate, said open voids having a minimum diameter of at least 2.5 angstroms and a minimum depth that is greater than the respective minimum diameter;

(b) selecting a precursor selected from the group consisting of a monomer, a comonomer, and combinations thereof, said precursor having one or more metallic components and dissolving said precursor in a liquid solvent to create a mixture of said precursor in solution;

(c) wetting said surface of said porous substrate with said precursor solution to coat said porous substrate;

(d) removing said liquid solvent from said precursor solution through removal of solvent from said surface to provide a substantially solvent-free residue of said precursor on said porous substrate;

(e) providing a plasma reaction chamber with a pair of spaced apart electrodes therewithin or other suitable mechanism for producing the plasma glow and with said reaction chamber having a configuration for supporting a plasma glow therewithin and for receiving said precursor coated porous substrate;

(f) introducing said precursor coated porous substrate into said reaction chamber;

(g) evacuating the atmosphere from within said reaction chamber and applying RF energy across said electrodes to initiate a plasma glow zone and maintaining said plasma glow with said application of RF energy while simultaneously introducing a plasma supporting gas to said plasma reaction chamber; and

(h) said plasma glow converting said precursor to dissociated form through separation of said one or more metallic components from said precursor to form a deposit consisting essentially of said one or more metallic components in elemental form as a cohesive film on the surface of said substrate, the combination of the cohesive film on said porous substrate forming a coated substrate media, said coated substrate media allowing fluid transport into and out from said open voids.

2. The method of claim 1 wherein said reaction chamber has an inlet end and an outlet end, and wherein said precursor coated substrate is moved through said plasma zone within said reaction chamber between said inlet end and said outlet end.

3. The method of claim 2 wherein movement of said coated substrate is substantially continuous.

4. The method of claim 2 wherein said substrate mount comprises spaced apart supply and take-up receiving spools.

5. The method of claim 2 wherein said substrate mount comprises an endless conveyor.

6. The method of claim 1 wherein said reaction chamber is generally tubular in configuration.

7. The method of claim 1 wherein said electrodes are moved substantially continuously.

8. The method of claim 1 wherein said metallic component is a noble metal.

9. The method of claim 8 wherein said noble metal is selected from the group consisting of platinum, silver, and gold.

10. The method of claim 1 wherein said precursor is platinum hexafluoroacetylacetonate.

11. The method of claim 1 wherein said precursor is (trimethyl) methylcyclopentadienyl platinum.

12. The method of claim 1 wherein said precursor is dimethyl (acetylacetonate) gold.

13. The method of claim 1 wherein said precursor is trimethyl phosphine (hexafluoroacetyl acetonate) silver.

14. The method of claim 1 wherein the surface of said porous substrate is pretreated for subsequent wetting by said precursor solution.

15. The method of claim 1 wherein said RF energy is delivered at a frequency of substantially 13.56 MHz.

16. The method of claim 1 wherein a magnetic field is added across said reaction zone.

17. The method of claim 1 wherein said plasma supporting gas is selected from the group consisting of argon, krypton, xenon, helium, and nitrogen.

18. The method of claim 1 wherein said plasma supporting gas is selected from the group consisting of oxygen, hydrogen, and gaseous fluorocarbon compounds.

19. The method of claim 1 wherein the inner walls of said reaction chamber are covered with a removable liner.

20. The method of claim 1 wherein said porous substrate consists essentially of a ceramic and wherein said precursor comprises a platinum compound.

21. The method of claim 20, including applying a second precursor having a silver compound to said coated substrate media and thereafter re-exposing the coated substrate media to the operations of steps (c) through (h) inclusive.

22. The method of claim 1 wherein said precursor comprises a silver compound.

23. The method of claim 22, including applying a second precursor having a platinum compound to said coated substrate media and thereafter re-exposing the coated substrate media to the operations of steps (c) through (h) inclusive.

24. A method of preparing continuous thin metallic films upon porous substrate surfaces, which method includes the steps of:

(a) selecting a porous substrate having open voids exposed to a surface of said porous substrate;

(b) selecting a precursor selected from the group consisting of a monomer, a comonomer, and combinations thereof, said precursor having one or more metallic components and dissolving said precursor in a liquid solvent to create a mixture of said precursor in solution;

(c) wetting said surface of said porous substrate with said precursor solution to coat said porous substrate;

(d) removing said liquid solvent from said precursor solution through removal of solvent from said surface to provide a substantially solvent-free residue of said precursor on said porous substrate;

(e) providing a plasma reaction chamber with a pair of spaced apart electrodes therewithin or other suitable mechanism for producing the plasma glow and with said reaction chamber having a configuration for supporting a plasma glow therewithin and for receiving said precursor coated porous substrate;

(f) introducing said precursor coated porous substrate into said reaction chamber;

(g) evacuating the atmosphere from within said reaction chamber and applying RF energy across said electrodes to initiate a plasma glow zone and maintaining said plasma glow with said application of RF energy while simultaneously introducing a plasma supporting gas to said plasma reaction chamber; and

(h) said plasma glow converting said precursor to dissociated form through separation of said one or more metallic components from said precursor to form a deposit consisting essentially of said one or more metallic components in elemental form as a cohesive film on the surface of said substrate, the combination of the cohesive film on said porous substrate forming a coated substrate media, said coated substrate media allowing fluid transport into and out from said open voids.