Wafer-level package for integrated circuits
First Claim
1. A method of wafer-level packaging an integrated circuit (IC) die, comprising:
- providing an IC wafer comprising a plurality of die and at least one electrical contact point associated with each die;
providing a first semiconductor cap wafer;
forming electrically conductive paths through the first semiconductor cap wafer at positions corresponding to respective ones of the electrical contact points on the IC wafer, such that each electrically conductive path extends from a first side of the first semiconductor cap wafer to a second side of the first semiconductor cap wafer and is insulated from at least a portion of the first semiconductor cap wafer; and
before cutting the die from the IC wafer, attaching the first semiconductor cap wafer to the IC wafer, such that the ends of the conductive paths on the first side of the first semiconductor cap wafer are electrically connected to the respective electrical contact points on the IC wafer.
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Accused Products
Abstract
A wafer-level packaged IC is made by attaching a cap wafer to the top of an IC wafer before cutting the IC wafer, i.e. before singulating the plurality of die on the IC wafer. The cap wafer is mechanically attached and electrically connected to the IC wafer, then the die are singulated. Electrically conductive paths extend through the cap wafer, between wafer contact pads on the top surface of the cap and electrical contact points on the IC wafer. Optionally, the cap wafer contains one or more die. The IC wafer can be fabricated according to a different technology than the cap wafer, thereby forming a hybrid wafer-level package. Optionally, additional “upper-level” cap wafers (with or without die) can be stacked to form a “multi-story” IC.
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Citations
33 Claims
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1. A method of wafer-level packaging an integrated circuit (IC) die, comprising:
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providing an IC wafer comprising a plurality of die and at least one electrical contact point associated with each die; providing a first semiconductor cap wafer; forming electrically conductive paths through the first semiconductor cap wafer at positions corresponding to respective ones of the electrical contact points on the IC wafer, such that each electrically conductive path extends from a first side of the first semiconductor cap wafer to a second side of the first semiconductor cap wafer and is insulated from at least a portion of the first semiconductor cap wafer; and before cutting the die from the IC wafer, attaching the first semiconductor cap wafer to the IC wafer, such that the ends of the conductive paths on the first side of the first semiconductor cap wafer are electrically connected to the respective electrical contact points on the IC wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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Specification