Vertically stacked field programmable nonvolatile memory and method of fabrication
First Claim
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1. A process for fabricating a cell in a 3-D semiconductor memory device comprising:
- forming a first conductor layer;
forming a first semiconductor layer overlying the conductor layer;
oxidizing at least a portion of the first semiconductor layer in a plasma to form an oxide layer thereon;
forming a second semiconductor layer overlying the oxide layer;
sequentially etching the second semiconductor layer, the oxide layer, the first semiconductor layer and the first conductor layer to form a line;
forming a second conductor layer overlying the line; and
sequentially etching the second conductor layer and the line to form a pillar of the 3-D semiconductor memory device, wherein the 3-D semiconductor memory device comprises a plurality of layers of memory cells stacked vertically above one another.
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Abstract
A very high density field programmable memory is disclosed. An array is formed vertically above a substrate using several layers, each layer of which includes vertically fabricated memory cells. The cell in an N level array may be formed with N+1 masking steps plus masking steps needed for contacts. Maximum use of self alignment techniques minimizes photolithographic limitations. In one embodiment the peripheral circuits are formed in a silicon substrate and an N level array is fabricated above the substrate.
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Citations
10 Claims
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1. A process for fabricating a cell in a 3-D semiconductor memory device comprising:
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forming a first conductor layer; forming a first semiconductor layer overlying the conductor layer; oxidizing at least a portion of the first semiconductor layer in a plasma to form an oxide layer thereon; forming a second semiconductor layer overlying the oxide layer; sequentially etching the second semiconductor layer, the oxide layer, the first semiconductor layer and the first conductor layer to form a line; forming a second conductor layer overlying the line; and sequentially etching the second conductor layer and the line to form a pillar of the 3-D semiconductor memory device, wherein the 3-D semiconductor memory device comprises a plurality of layers of memory cells stacked vertically above one another. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A process for fabricating a cell in a 3-D semiconductor memory device comprising:
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forming a first conductor layer; forming a first semiconductor layer overlying the first conductor layer; oxidizing at least a portion of the first semiconductor layer to form an oxide layer thereon; forming a second semiconductor layer overlying the oxide layer; sequentially etching the second semiconductor layer, the oxide layer, the first semiconductor layer, the first conductor layer to form a line; forming a second conductor layer overlying the first line; etching the second conductor layer to form a second line orthogonal to the first line and etching the first line to form a pillar; and forming edge regions on the pillar using a plasma oxidation process; wherein the 3-D semiconductor memory device comprises a plurality of layers of memory cells stacked vertically above one another.
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Specification