Methods, apparatus, and systems involving ion beam generation

• US 7,271,400 B1
• Filed: 08/06/2004
• Issued: 09/18/2007
• Est. Priority Date: 03/25/2002
• Status: Expired due to Fees

• Current Assignee: George H. Miley, Yasser R. Shaban
• Original Assignee: George H. Miley, Yasser R. Shaban
• Inventors: Miley, George H., Shaban, Yasser R.
• Primary Examiner(s): Font; Frank G.
• Assistant Examiner(s): EL SHAMMAA, MARY A
• Application Number:
  US10/913,965
• Time in Patent Office: 1,138 Days
• Field of Search: 250/492.3
• US Class Current: 250/492.3
• CPC Class Codes: G21K 1/093 by magnetic means
• CPC Class Codes: H01J 2237/08 Ion sources
• CPC Class Codes: H01J 27/16 using high-frequency excitation, e.g. microwave excitation

Abstract

A high-perveance steady state deuterium ion gun was developed using a magnetic-index resonator in an Inductive Coupling Radio Frequency (ICRF) configuration. This approach made it feasible to generate an ion beam within millimeter dimensions extracted by negative potential placed at several centimeters from the exit of the ion source. The ion gun allows high extraction efficiency and low beam divergence as compared to other approaches.

Claims

1. An apparatus, comprising:

an ion gun coupled to a gas source, the ion gun including an ion gun chamber;

a resonator operable to ionize gas received in the ion gun chamber from the gas source, the resonator including an RF electrical energy source, a helical coil wound about a portion of the ion gun chamber and coupled to the RF electrical energy source and an electrical shield positioned about the helical coil;

a magnetic indexing arrangement including several magnetic coils positioned about the ion gun chamber between the gas source and the resonator, a first one and a second one of the magnetic coils having a magnetic field strength greater than a third one of the magnetic coils, the third one of the magnetic coils being positioned between the first one and the second one of the coils.

2. The apparatus of claim 1, further comprising a processing chamber coupled to the chamber to receive an ion beam from the ion gun chamber.

3. The apparatus of claim 2, further comprising an electrode positioned in the processing chamber and electrically isolated therefrom.

4. The apparatus of claim 3, further comprising a first conveyor subsystem coupled to the processing chamber to deliver work pieces to the processing chamber.

5. The apparatus of claim 4, further comprising a second conveyor subsystem coupled to the processing chamber to retrieve work pieces from the processing chamber.

6. The apparatus of claim 3, wherein the processing chamber is electrically grounded and the electrode is negatively biased relative to electrical ground.

7. The apparatus of claim 2, further comprising an inertial electrostatic containment device positioned in the processing chamber.

8. An apparatus, comprising:

a chamber coupled to a gas source;

a resonator operable to ionize gas received in the chamber from the gas source, the resonator extending along the chamber and including an RF electrical energy source;

a particle trap positioned between the gas source and the resonator along the chamber; and

a focusing arrangement including an aperture device and a magnetic focusing coil, the aperture device including at least a portion that is electrically floating relative to a wall of the chamber.

9. The apparatus of claim 8, further comprising an inertial electrostatic containment device positioned in the processing chamber.

10. The apparatus of claim 8, wherein the particle trap includes several magnetic coils, and a first one of the several magnetic coils is structured to generate a magnetic field strength greater than a second one of the several magnetic coils.

11. The apparatus of claim 10, where one or more of the several magnetic coils include a winding that reverses direction.

12. The apparatus of claim 8, further comprising:

a processing chamber coupled to the chamber to receive an ion beam from the focusing arrangement; and

an electrode positioned in the processing chamber, the electrode being electrically isolated from the chamber.

13. The apparatus of claim 12, further comprising a processing chamber is electrically grounded and the electrode is negatively biased relative to electrical ground.

14. An apparatus, comprising:

a chamber coupled to a gas source;

a resonator operable to ionize gas received in the chamber from the gas source, the resonator extending along the chamber and including an RF electrical energy source;

a magnetic indexing arrangement including at least three magnetic coils positioned about the chamber between the gas source and the resonator, one or more of the magnetic coils including a winding that reverses direction and being operable to provide a different magnetic field strength relative to one or more other of the magnetic coils; and

a focusing arrangement including an aperture device and a magnetic focusing coil positioned between the resonator and the aperture device.

15. The apparatus of claim 14, wherein a first one and a second one of the magnetic coils are structured to provide a magnetic filed strength greater than a third one of the magnetic coils, and the third one of the magnetic coils is positioned between the first one and the second one of the coils.

16. The apparatus of claim 14, further comprising a processing chamber coupled to the chamber to receive an ion beam from the aperture device.

17. The apparatus of claim 16, further comprising an electrode positioned in the processing chamber and electrically isolated therefrom.

18. The apparatus of claim 17, wherein the processing chamber is electrically grounded and the electrode is negatively biased relative to electrical ground.

19. The apparatus of claim 16, further comprising an inertial electrostatic containment device positioned in the processing chamber.

20. The apparatus of claim 14, wherein the aperture device includes a portion that is operable to be electrically floating relative to a wall of the chamber.