Method for fabrication of optical element, and optical element having three-dimensional laminated structure

• US 7,272,290 B2
• Filed: 11/08/2004
• Issued: 09/18/2007
• Est. Priority Date: 11/07/2003
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Yonehara, Takao, Sugita, Mitsuro
• Primary Examiner(s): Font; Frank G.
• Assistant Examiner(s): Blevins; Jerry Martin
• Application Number:
  US10/571,696
• Publication Number:
  US 20070031108A1
• Time in Patent Office: 1,044 Days
• Field of Search: 385129-132
• US Class Current: 385/129
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: G02B 6/12 of the integrated circuit kind electric integrated circuits H01L27/00
• CPC Class Codes: G02B 6/12002 Three-dimensional structures
• CPC Class Codes: G02B 6/1225 comprising photonic band-gap structures or photonic lattices
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method
• CPC Class Codes: G02B 6/136 by etching
• CPC Class Codes: G02B 6/14 Mode converters

Abstract

A method for production of an optical element includes preparing a first member having formed on the surface of a first substrate 101 a first layer 103 by at least one of epitaxial growth and pore-making (micropore-making) and a second member having a porous layer for layer separation formed on a second substrate 104 and having formed thereon a second layer by at least one of epitaxial growth and pore-making (micropore-making), bonding the first layer 103 and the second layer, separating the second substrate 104 and the second layer of the second member from each other at the porous layer for layer separation in the second member, to form a laminated structure on the first substrate 101, forming a refraction index distribution pattern produced by a difference in refraction index in the plane of at least one of the first layer 103 and the second layer.

Claims

1. A method for production of an optical element comprising the steps of:

(a) forming alternatingly porous layers and microporous layers on a first substrate;

(b) forming a refraction index distribution pattern on the microporous layers collectively;

(c) bonding a second substrate to the porous layer or microporous layer being the outermost layer;

(d) separating a pair of microporous layers spaced by the porous layer at the porous layer;

(e) shifting the separated microporous layers from each other along an in-plane direction, and bonding the shifted microporous layers to each other; and

(f) repeating said steps (d) and (e) for each porous layer.

2. A method for production of an optical element comprising the steps of:

(a) forming alternatingly porous layers and microporous layers on a first substrate;

(b) forming a refraction index distribution pattern on the microporous layers collectively;

(c) bonding a second substrate to the microporous layer being the outermost layer;

(d) removing the porous layer adjacent to the microporous layer bonded to the second substrate; and

(e) shifting the microporous layer exposed at a first substrate end by removing of the porous layer from the microporous layer transfeffed on the second substrate along an in-plane direction, and bonding the microporous layers to each other.