Charged particle beam apparatus and method for operating the same

• US 7,274,018 B2
• Filed: 04/03/2006
• Issued: 09/25/2007
• Est. Priority Date: 01/17/2003
• Status: Active Grant

• Current Assignee: ICT Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik mbH
• Original Assignee: ICT Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik mbH
• Inventors: Adamec, Pavel, Winkler, Dieter, Degenhardt, Ralf, Feuerbaum, Hans-Peter, Munack, Harry
• Primary Examiner(s): NGUYEN, KIET TUAN
• Application Number:
  US11/396,751
• Publication Number:
  US 20060192145A1
• Time in Patent Office: 540 Days
• Field of Search: 250/310, 250/306, 250/307
• US Class Current: 250/310
• CPC Class Codes: H01J 2237/0435 Multi-aperture
• CPC Class Codes: H01J 2237/049 Focusing means
• CPC Class Codes: H01J 2237/2855 Photo-emission
• CPC Class Codes: H01J 2237/2857 Particle bombardment induced emission
• CPC Class Codes: H01J 37/265 Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01J 37/285 Emission microscopes, e.g. field-emission microscopes

Abstract

A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

Claims

1. A method for serially operating a charged particle beam apparatus, comprising:

providing a charged particle beam apparatus;

adjusting a beam shaping means for collimating a primary beam of charged particles as to collimate said primary beam of charged particles resulting in a width appropriate for serial imaging of a sample;

scanning said sample using a scanning means, wherein said primary beam of charged particles is directed to a respective position of a single pixel on said sample; and

detecting secondary charged particles by means of a sectorized detector, wherein signals produced by individual sectors of said detector are merged to form a signal corresponding to said single pixel, wherein the charged particle beam apparatus is switched in operation between SEM and at least one of modes SEEM, PEEM, and SEEM/PEEM.

2. The method according to claim 1, further comprising:

adjusting the beam shaping means for collimating the primary beam of charged particles as to collimate said primary beam of charged particles resulting in a width appropriate for parallel imaging of a sample,

directing said primary beam of charged particles to a predetermined position on said sample, and

detecting secondary charged particles by means of the sectorized detector, wherein the signals produced by individual sectors of said detector are individually collected.

3. The method according to claim 2, wherein said primary beam width appropriate for parallel imaging is between 0.5 μ

m and 1000 μ

m.

4. The method according to claim 2, wherein the beam shaping means comprises-an objective lens for focusing said primary beam, and wherein said objective lens switches between forming an image of said charged particle source in a plane of a surface of a sample to be serially inspected and forming an image of an aperture means in a plane of a surface of a sample to be parallel inspected.

5. The method according to claim 2, wherein said beam shaping means comprises a condenser lens, and wherein said condenser lens switches the beam width of said primary beam between a width appropriate for serial imaging and a width appropriate for parallel imaging.

6. The method according to claim 2, further comprising:

switching between an aperture having a diameter in the range of 10 μ

m to 50 μ

m in the case of serial imaging and an aperture having a diameter in the range of 100 μ

m to 200 μ

m in the case of parallel imaging.

7. The method according to claim 1, wherein said primary beam width appropriate for serial imaging is between 1 nm and 100 nm.

8. The method according to claim 1, further comprising:

producing a light beam; and

directing said light beam to a predetermined position on said sample.

9. The method according to claim 8, wherein the charged particle beam and the light beam are adjusted to cancel a charge build-up on the sample surface.

10. The method according to claim 8, wherein the primary beam of charged particles is blanked by blanking means.