×

Lithographic apparatus and device manufacturing method

  • US 7,274,029 B2
  • Filed: 12/28/2004
  • Issued: 09/25/2007
  • Est. Priority Date: 12/28/2004
  • Status: Expired due to Fees
First Claim
Patent Images

1. A lithographic apparatus, comprising:

  • an illumination system that conditions a radiation beam;

    an array of individually controllable elements that pattern the beam;

    a projection system that projects the patterned beam onto a target portion of a substrate and comprising an array of lenses arranged in a plane, such that each lens transmits a different part of the patterned beam;

    a measuring device that measures a distance between a part of the substrate and a part of the array of lenses, the distance being measured perpendicular to the substrate; and

    an actuator that adjusts a position of the array of lenses based on measurements by the measuring device wherein the adjusted position is substantially perpendicular to the plane.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×