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Apparatus for forming a striation reduced chemical mechanical polishing pad

  • US 7,275,928 B2
  • Filed: 11/23/2004
  • Issued: 10/02/2007
  • Est. Priority Date: 11/23/2004
  • Status: Active Grant
First Claim
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1. An apparatus for forming a chemical mechanical polishing pad, comprising:

  • a tank with polymeric materials;

    a storage silo with microspheres;

    a curative storage tank with curing agents;

    a premix prep tank for forming a pre-mixture of the polymeric materials and the microspheres;

    a recirculation loop in the premix prep tank for recirculating the pre-mixture until a desired bulk density is reached;

    a premix run tank for storing the pre-mixture;

    a mixer for forming a mixture of the pre-mixture and the curing agents; and

    a mold for molding the mixture.

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