Defect detection using energy spectrometer
First Claim
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1. An apparatus for detecting defects in substrates, the apparatus comprising:
- an irradiation source configured to generate an incident beam;
a lens system configured to focus the incident beam onto a target substrate so as to cause emission of electrons;
a multiple-bin detector configured to detect the emitted electrons directly from the target substrate, wherein each bin of the detector detects the emitted electrons within a range of energies; and
a processing system configured to process signals from the multiple-bin detector.
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Abstract
One embodiment disclosed relates to an apparatus for detecting defects in substrates. An irradiation source is configured to generate an incident beam, and a lens system configured to focus the incident beam onto a target substrate so as to cause emission of electrons. A multiple-bin detector is configured to detect the emitted electrons, and each bin of the detector detects the emitted electrons within a range of energies. A processing system configured to process signals from the multiple-bin detector. Other embodiments are also disclosed.
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Citations
19 Claims
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1. An apparatus for detecting defects in substrates, the apparatus comprising:
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an irradiation source configured to generate an incident beam; a lens system configured to focus the incident beam onto a target substrate so as to cause emission of electrons; a multiple-bin detector configured to detect the emitted electrons directly from the target substrate, wherein each bin of the detector detects the emitted electrons within a range of energies; and a processing system configured to process signals from the multiple-bin detector. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of imaging defects in substrates, the method comprising:
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generating an incident beam of irradiation; focusing the incident beam onto a target substrate so as to cause emission of electrons; detecting the emitted electrons directly from the target substrate into multiple energy bins, wherein each energy bin counts the emitted electrons within a range of energies; and processing signals from the multiple energy bins, wherein said processing includes determining an indication of a shift in surface charge. - View Dependent Claims (15, 16)
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17. An automated inspection apparatus for detecting defects in substrates, the apparatus comprising:
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means for creating an incident beam of irradiation; means for impinging the incident beam onto a target substrate so as to cause emission of electrons; means for detection of the emitted electrons directly from the target substrate into multiple energy bins, wherein each energy bin counts the emitted electrons within a range of electron energies; and means for processing data signals derived from the multiple energy bins, wherein the means for processing is configured to determine an indication of a shift in surface charge. - View Dependent Claims (18, 19)
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Specification