Micro-electro-mechanical switch and a method of using and making thereof

• US 7,280,014 B2
• Filed: 03/12/2002
• Issued: 10/09/2007
• Est. Priority Date: 03/13/2001
• Status: Expired due to Term

• Current Assignee: Rochester Institute of Technology
• Original Assignee: Rochester Institute of Technology
• Inventors: Potter, Michael D.
• Primary Examiner(s): Enad, Elvin
• Assistant Examiner(s): Rojas, Bernard
• Application Number:
  US10/096,472
• Publication Number:
  US 20020131228A1
• Time in Patent Office: 2,037 Days
• Field of Search: 335/78, 200/181
• US Class Current: 335/78
• CPC Class Codes: H01H 2059/009 using permanently polarised dielectric layers
• CPC Class Codes: H01H 59/0009 making use of micromechanics

Abstract

A micro-electro-mechanical switch includes at least one portion of a conductive line in the chamber, a beam with imbedded charge, and control electrodes. The beam has a conductive section which is positioned in substantial alignment with the at least one portion of the conductive line. The conductive section of the beam has an open position spaced away from the at least one portion of the conductive line and a closed position on the at least one portion of the conductive line. Each of the control electrodes is spaced away from an opposing side of the beam to control movement of the beam.

Claims

1. A switch comprising:

at least one portion of a conductive line;

a beam comprising two or more insulating layers, wherein one of the two or more insulating layers is located directly on the other one of the two or more insulating layers and the layers hold a fixed, imbedded charge, the beam having a conductive section which is positioned in substantial alignment with the at least one portion of the conductive line, the conductive section of the beam having an open position spaced away from the at least one portion of the conductive line and a closed position on the at least one portion of the conductive line;

an

control electrodes, each of the control electrodes are spaced away from an opposing side of the beam to control movement of the beam.

2. The switch as set forth in claim 1 further comprising a switch housing with a chamber, the beam extending into the chamber and the at least one portion of a conductive line is in the chamber.

3. The switch as set forth in claim 2 wherein at least one of the control electrodes is located in the chamber.

4. The switch as set forth in claim 2 wherein the control electrodes are all located outside the chamber in the switch housing.

5. The switch as set forth in claim 2 further comprising:

an opening into the chamber; and

a plug sealing the opening into the chamber.

6. The switch as set forth in claim 2 wherein the chamber is a vacuum chamber.

7. The switch as set forth in claim 2 wherein the chamber is a filled with at least one gas.

8. The switch as set forth in claim 1 wherein the conductive section is located at or adjacent an end of the beam.

9. The switch as set forth in claim 1 wherein the conductive section is a contactor connected to the beam.

10. The switch as set forth in claim 1 wherein the at least one portion of a conductive line comprises a pair of separated portions of a conductive line, the conductive section is positioned in substantial alignment with the separated portions of the conductive line.

11. The switch as set forth in claim 1 wherein each of the control electrodes are in alignment along at least one axis which extends substantially perpendicularly through the two or more insulating layers of the beam and each of the control electrodes.

13. The method as set forth in claim 10 further comprising:

applying a potential with a second polarity to the control electrodes; and

moving the conductive section on to one of an open position spaced away from the at least one portion of the conductive line or a closed position on the at least one portion of the conductive line in response to the second polarity of the applied potential.

12. A method of using a switch, the method comprising:

applying a potential with a first polarity to control electrodes which are spaced away from opposing side of a beam to control movement of the beam, wherein the beam comprises two or more insulating layers, wherein one of the two or more insulating layers is located directly on the other one of the two or more insulating layers and the layers hold a fixed, imbedded charge and the beam has a conductive section which is positioned in substantial alignment with a conductor; and

moving the conductive section on the beam to one of an open position spaced away from the conductor or a closed position on the conductor in response to the first polarity of the applied potential.

14. The method as set forth in claim 12 wherein the first polarity is opposite from the second polarity.

15. The method as set forth in claim 12 wherein the beam extends into a chamber in a switch housing and the at least one portion of a conductive line is in the chamber.

16. The method as set forth in claim 15 wherein at least one of the control electrodes is located in the chamber.

17. The method as set forth in claim 15 wherein the control electrodes are all located outside the chamber in the switch housing.

18. The method as set forth in claim 15 wherein the chamber is a vacuum chamber.

19. The method as set forth in claim 15 wherein the chamber is filled with at least one gas.

20. The method as set forth in claim 12 wherein the conductive section is located at or adjacent an end of the beam.

21. The method as set forth in claim 12 wherein the conductive section is a contactor connected to the beam.

22. The method as set forth in claim 12 wherein each of the control electrodes are in alignment along at least one axis which extends substantially perpendicularly through the two or more insulating layers of the beam and each of the control electrodes.