Full wafer contacter and applications thereof

• US 7,282,931 B2
• Filed: 02/27/2004
• Issued: 10/16/2007
• Est. Priority Date: 02/19/2003
• Status: Expired due to Term

• Current Assignee: Translarity, Inc.
• Original Assignee: Octavian Scientific, Inc.
• Inventors: Johnson, Morgan T.
• Primary Examiner(s): KARLSEN, ERNEST F
• Application Number:
  US10/789,305
• Publication Number:
  US 20040164295A1
• Time in Patent Office: 1,327 Days
• Field of Search: None
• US Class Current: 324/754.15
• CPC Class Codes: H01L 21/76838 characterised by the formation and the after-treatment of the conductors etching for patterning the conductors H01L21/3213
• CPC Class Codes: H01L 23/5382 Adaptable interconnections, e.g. for engineering changes
• CPC Class Codes: H01L 24/72 Detachable connecting means consisting of mechanical auxiliary parts connecting the device, e.g. pressure contacts using springs or clips
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/01013 Aluminum [Al]
• CPC Class Codes: H01L 2924/01027 Cobalt [Co]
• CPC Class Codes: H01L 2924/01029 Copper [Cu]
• CPC Class Codes: H01L 2924/01033 Arsenic [As]
• CPC Class Codes: H01L 2924/01075 Rhenium [Re]
• CPC Class Codes: H01L 2924/01079 Gold [Au]
• CPC Class Codes: H01L 2924/12042 LASER
• CPC Class Codes: H01L 2924/14 Integrated circuits

Abstract

A replacement for probe cards includes a full wafer contacter. A first surface of the full wafer contacter is brought into contact with, and the contacter is attached to, a wafer, thereby making electrical connection with at least a portion of the contact pads on each of a plurality of integrated circuits on the wafer. The full wafer contacter provides conductive pathways from the IC contact pads to a second surface of the full wafer contacter where a corresponding set of contact pads provide access to test systems and/or other devices. The contact pads on the second surface of the full wafer contacter are typically larger than the contact pads of the integrated circuits, and are typically spaced father apart from each other. The full wafer contacter is constructed to be suitable to provide access to the contact pads of the unsingulated integrated circuits during a wafer burn-in process.

Claims

1. A method of electrically accessing a plurality of integrated circuits, each integrated circuit having a plurality of terminals, the method comprising:

providing a wafer having a first and a second major surface, the plurality of integrated circuits disposed on a first major surface thereof, each of the plurality of integrated circuits having a plurality of terminals, and the plurality of integrated circuits disposed over at least a portion of the first major surface;

providing a full wafer contacter having a first major surface and a second major surface, a first plurality of contact terminals disposed on the first major surface of the full wafer contacter in a pattern that corresponds to the terminal layout of the plurality of integrated circuits; and

removably attaching the full wafer contacter to the wafer such that the first major surface of the wafer and the first major surface of the full wafer contacter are facing each other, the sealing ring is in contact with the full wafer contactor and the wafer, and such that at least a portion of the terminals of the integrated circuits are in electrical contact with the first plurality of contact terminals;

wherein each of the first plurality of contact terminals is electrically coupled to a corresponding one of a second plurality of contact terminals disposed on the second major surface of the full wafer contacter.

2. The method of claim 1, wherein removably attaching comprises vacuum attaching.

3. The method of claim 1, wherein removably attaching comprises producing a low pressure zone between the full wafer contacter and the wafer.

4. The method of claim 3, wherein removably attaching comprises, in an atmosphere containing one or more gases, placing the full wafer contacter over the wafer, and evacuating at least a portion of the one or more gases disposed between the full wafer contacter and the wafer.

5. The method of claim 1, wherein the integrated circuit terminals comprise bonding pads.

6. The method of claim 1, wherein the integrated circuit terminals comprise solder bumps.

7. The method of claim 1, further comprising aligning the full wafer contacter to the wafer such that the terminals of the integrated circuits and the terminals disposed on the first major surface of the full wafer contacter will be in electrical contact when the full wafer contacter is removably attached to the wafer.

8. The method of claim 1, wherein a first portion of the plurality of integrated circuits has a first terminal layout pattern, and a second portion of the plurality of integrated circuits has a second terminal layout pattern, and the first and second terminal layout patterns are different.

9. The method of claim 1, wherein each of the first portion of the plurality of integrated circuits has a first die size, and each of the second portion of the plurality of integrated circuits has a second die size, and the first and second die sizes are different.

10. The method of claim 1, wherein the wafer has a first area, the full wafer contacter has a second area, and the first area is greater than the second area.

11. The method of claim 1, wherein the full wafer contacter is thinner than the wafer.

12. The method of claim 1, further comprising introducing an inert gas between the full wafer contacter and the wafer.