System for search and analysis of systematic defects in integrated circuits
First Claim
1. A method of locating systematic defects in integrated circuits, said method comprising:
- performing preliminary extracting and index processing of a circuit design comprising;
transforming shapes in a circuit layout into feature vectors by finding intersections between basis patterns and said shapes in said circuit layout; and
comparing said feature vectors to produce an index of feature vectors; and
after performing said preliminary extracting and index processing, performing a process of feature searching comprising;
identifying a defect region of said circuit layout;
transforming shapes in said defect region into defect vectors by finding intersections between basis patterns and said shapes and said defect region; and
finding feature vectors that are similar to said defect vectors using said index of feature vectors.
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Accused Products
Abstract
Disclosed is a method of locating systematic defects in integrated circuits. Extracting and index processing of a circuit design and feature searching are performed. During extracting and index processing, a window grid for the circuit design is established and basis patterns are merged with shapes within each. Shapes in each window are transformed into feature vectors by finding intersections between basis patterns and shapes. Feature vectors are clustered to produce an index of feature vectors. During feature searching, a defect region window of the circuit layout is identified and basis patterns are merged with shapes in the defect region window. Shapes in the defect region window are transformed into defect vectors by finding intersections between basis patterns and shapes. Feature vectors similar to the defect vector are found using representative feature vectors from the index of feature vectors. Similarities and differences between defect vectors and feature vectors are analyzed.
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Citations
21 Claims
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1. A method of locating systematic defects in integrated circuits, said method comprising:
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performing preliminary extracting and index processing of a circuit design comprising; transforming shapes in a circuit layout into feature vectors by finding intersections between basis patterns and said shapes in said circuit layout; and comparing said feature vectors to produce an index of feature vectors; and after performing said preliminary extracting and index processing, performing a process of feature searching comprising; identifying a defect region of said circuit layout; transforming shapes in said defect region into defect vectors by finding intersections between basis patterns and said shapes and said defect region; and finding feature vectors that are similar to said defect vectors using said index of feature vectors. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of locating systematic defects in integrated circuits, said method comprising:
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performing preliminary extracting and index processing of a circuit design comprising; establishing a window grid for said circuit design; merging basis patterns with shapes in said circuit design within each window of said window grid; transforming shapes in each window into feature vectors by finding intersections between said basis patterns and said shapes in said each window; and comparing said feature vectors to produce an index of feature vectors; and after performing said preliminary extracting and index processing, performing a process of feature searching comprising; identifying a defect region window of said circuit design; merging basis patterns with shapes in said defect region window; transforming said shapes in said defect region window into defect vectors by finding intersections between basis patterns and said shapes in said defect region; and finding feature vectors that are similar to said defect vectors using said index of feature vectors. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A method of locating systematic defects in integrated circuits, said method comprising:
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performing preliminary extracting and index processing of a circuit design comprising; establishing a window grid for said circuit design; merging basis patterns with shapes in said circuit design within each window of said window grid; transforming shapes in each window into feature vectors by finding intersections between said basis patterns and said shapes in said each window; and comparing said feature vectors to produce an index of feature vectors; and after performing said preliminary extracting and index processing, performing a process of feature searching comprising; identifying a defect region window of said circuit design; merging basis patterns with shapes in said defect region window, wherein said merging process includes rotating and mirroring said shapes in said defect region window; transforming said shapes in said defect region window into defect vectors by finding intersections between basis patterns and said shapes in said defect region window; and finding feature vectors that are similar to said defect vectors using representative feature vectors from said index of feature vectors. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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Specification