Electric field reducing thrust plate
First Claim
1. A contact ring assembly for supporting a substrate in an electrochemical processing system, comprising:
- an annular contact ring configured to support and electrically contact a processing surface of the substrate;
a thrust plate movably positioned to engage a backside of the substrate positioned on the contact ring; and
a lip seal member extending from an outer perimeter of the thrust plate and contacting an inner surface of the contact ring to prevent fluid flow therebetween, wherein the lip seal member comprises at least one bubble release channel formed therethrough.
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Accused Products
Abstract
A method and apparatus for an electrochemical processing cell that is configured to minimize bevel and backside deposition. The apparatus includes a contact ring assembly for supporting a substrate, a thrust plate movably positioned to engage a substrate positioned on the contact pins, and a lip seal member positioned to contact the thrust plate and the contact ring to prevent fluid flow therebetween. The lip seal includes at least one bubble release channel formed therethrough. The method includes positioning an electric field barrier between a backside substrate engaging member and a frontside substrate supporting member to prevent electric field from traveling to the bevel and backside of the substrate. The electric field barrier including at least one bubble release channel formed therethrough.
139 Citations
20 Claims
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1. A contact ring assembly for supporting a substrate in an electrochemical processing system, comprising:
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an annular contact ring configured to support and electrically contact a processing surface of the substrate; a thrust plate movably positioned to engage a backside of the substrate positioned on the contact ring; and a lip seal member extending from an outer perimeter of the thrust plate and contacting an inner surface of the contact ring to prevent fluid flow therebetween, wherein the lip seal member comprises at least one bubble release channel formed therethrough. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A contact ring assembly for supporting a substrate in an electrochemical processing system, comprising:
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an annular contact ring having a plurality of substrate supporting electrical contact pins extending therefrom; a thrust plate assembly movably positioned to engage a substrate positioned on the contact pins; an electric field barrier positioned between an outer perimeter of the thrust plate and a surface of the contact ring; and at least one bubble release channel formed into the electric field barrier. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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- 15. A method for processing a substrate in an electrochemical processing system, comprising positioning an electric field barrier between a backside substrate engaging member and a frontside substrate supporting member, the field barrier having at least one bubble release channel formed therethrough.
Specification