Method for producing a cover, method for producing a packaged device
First Claim
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1. A method for producing covers for a plurality of regions on a system wafer, each region comprising a device, wherein contact pads for the devices are provided outside each region, the method comprising:
- providing the system wafer having the devices;
producing a frame structure for each region of the system wafer, wherein the step of producing a frame structure further comprises the following substeps;
spinning a first photostructurable epoxy resin material onto the system wafer;
exposing the first photostructurable epoxy resin material;
developing the first photostructurable epoxy resin material; and
removing the epoxy resin material defined by the exposure of the first photostructurable epoxy resin material to obtain the frame structure for each region of the system wafer;
providing a support wafer, wherein the support wafer comprises a sacrificial layer;
producing a cap structure for attaching to the frame structure so that the region between the cap structure and the system wafer is covered, wherein the step of producing a cap structure further comprises the following substeps;
spinning a second photostructurable epoxy resin material onto the sacrificial layer on the support wafer; and
structuring the second photostructurable epoxy resin material to produce the cap structure;
connecting the cap structure to the frame structure; and
removing the sacrificial layer from the support wafer to separate the cap structure from the support wafer.
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Abstract
In a method for producing a cover for a region of a substrate, first a frame structure is produced in the region of the substrate, and then a cap structure is attached to the frame structure so that the region under the cap structure is covered. Thus, sensitive devices may be protected easily and at low cost from external influences and particularly from a casting material for casting the entire packaged device, which results when a diced chip is cast.
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Citations
13 Claims
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1. A method for producing covers for a plurality of regions on a system wafer, each region comprising a device, wherein contact pads for the devices are provided outside each region, the method comprising:
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providing the system wafer having the devices; producing a frame structure for each region of the system wafer, wherein the step of producing a frame structure further comprises the following substeps; spinning a first photostructurable epoxy resin material onto the system wafer; exposing the first photostructurable epoxy resin material; developing the first photostructurable epoxy resin material; and removing the epoxy resin material defined by the exposure of the first photostructurable epoxy resin material to obtain the frame structure for each region of the system wafer; providing a support wafer, wherein the support wafer comprises a sacrificial layer; producing a cap structure for attaching to the frame structure so that the region between the cap structure and the system wafer is covered, wherein the step of producing a cap structure further comprises the following substeps; spinning a second photostructurable epoxy resin material onto the sacrificial layer on the support wafer; and structuring the second photostructurable epoxy resin material to produce the cap structure; connecting the cap structure to the frame structure; and removing the sacrificial layer from the support wafer to separate the cap structure from the support wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification